臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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"黃嘉宏"

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Showing items 26-39 of 39 (2 Page(s) Totally)
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Institution	Date	Title	Author
國立高雄師範大學	2007	Study of Low-Cost High Efficient Si MOS Solar Cells with Oxides Rapidly Deposited at Room Temperature	Chia-Hong Huang; 黃嘉宏
國立高雄師範大學	2006-08	快速室溫沉積氧化層低成本高效率金氧半太陽能電池之研發	黃嘉宏; Chia-Hong Huang
國立高雄師範大學	2005-08	基板注入遲滯式氧化層崩潰後金氧半場效電晶體特性之研究	黃嘉宏; Chia-Hong Huang
國立高雄師範大學	2005	The Effect of Photon Illumination in Rapid Thermal Processing on the Characteristics of MOS Structures with Ultra-thin Oxides Examined by Substrate Injection	Chia-Hong Huang;Jenn-Gwo Hwu; 黃嘉宏
國立高雄師範大學	2004-08	基板注入氧化層崩潰後金氧半元件特性之研究	黃嘉宏; Chia-Hong Huang
國立高雄師範大學	2002-08	快速熱製程中熱輻射對超薄氧化層膜金氧半元件影響之研究	黃嘉宏; Chia-Hong Huang
元智大學	2002	校園網路使用與學生學業成績之關聯性研究	黃嘉宏; Jia-Hung Huang
國立高雄師範大學	2002	Effect of Mechanical Stress on the Characteristics of Silicon Thermal Oxides	Chia-Hong Huang;Jui-Yuan Yen;Jenn-Gwo Hwu; 黃嘉宏
國立高雄師範大學	2001	Breakdown Characteristics of Ultra-thin Gate Oxide ( < 4nm ) in MOS Structure Subjected Substrate Injection	Chia-Hong Huang;Jenn-Gwo Hwu; 黃嘉宏
國立高雄師範大學	2001	Anomalous Low-Voltage Tunneling Current ( LVTC ) Characteristics of Ultra-Thin Gate Oxide ( ~2nm ) after High Field Stress	Chia-Hong Huang;Jenn-Gwo Hwu; 黃嘉宏
國立高雄師範大學	2000	Enhancement in Soft Breakdown Occurrence on Ultra-thin Gate Oxides Caused by Photon Effect in Rapid Thermal Post Oxidation Annealing	Chia-Hong Huang;Jenn-Gwo Hwu; 黃嘉宏
國立高雄師範大學	2000	Role of Interface Trap Generation in the Low-Voltage Tunneling Current ( LVTC ) Characteristics of Ultra-Thin Gate Oxide ( ~2nm ) under High Field Stress	Chia-Hong Huang;Jenn-Gwo Hwu; 黃嘉宏
中國醫藥大學	2000	基於自動分類為基礎的圖書題名特徵擷取之研究-以輔助圖書分類系統為例	黃嘉宏; Huang, Jia-Hon
國立高雄師範大學	1999	The Breakdown Properties of Front- and Back-side Post Oxidation Annealed( POA ) Ultrathin Gate Oxide ( <3nm ) under High Field Stress	Chia-Hong Huang;Jenn-Gwo Hwu; 黃嘉宏

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