English  |  正體中文  |  简体中文  |  2827024  
???header.visitor??? :  32062478    ???header.onlineuser??? :  1325
???header.sponsordeclaration???
 
臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)
???ui.leftmenu.abouttair???

???ui.leftmenu.bartitle???

???index.news???

???ui.leftmenu.copyrighttitle???

???ui.leftmenu.link???

"alek c chen"???jsp.browse.items-by-author.description???

???jsp.browse.items-by-author.back???
???jsp.browse.items-by-author.order1??? ???jsp.browse.items-by-author.order2???

Showing items 1-20 of 20  (1 Page(s) Totally)
1 
View [10|25|50] records per page

Institution Date Title Author
臺大學術典藏 2022-01-03T08:01:26Z Method for calibrating a Manufacturing process model Kuen-Yu Tsai*; Alek C. Chen;  Jia-Han Li; JIA-HAN LI
臺大學術典藏 2022-01-03T08:01:17Z Fabrication of metrology test structures with programmed line edge roughness using electron beam direct write Fu-Min Wang; Kuen-Yu Tsai;  Jia-Han Li; Alek C. Chen; Yen-Min Lee; Yu-Tian Shen; Hsin-Hung Cheng; Chieh-Hsiang Kuan; JIA-HAN LI
臺大學術典藏 2022-01-03T08:01:15Z Optical metrology of shape-varying nano-patterned gratings by analyzing the scattering signals in their pupil images Yen-Min Lee;  Jia-Han Li*; Fu-Min Wang; Hsin-Hung Cheng; Yu-Tian Shen;   Kuen-Yu Tsai; Alek C. Chen; JIA-HAN LI
臺大學術典藏 2018-09-10T09:50:34Z Direct-scatterometry-enabled optical-proximity-correction-model calibration Chih-Yu Chen;Philip C. W. Ng;Chun-Hung Liu;Yu-Tian Shen;Kuen-Yu Tsai;Jia-Han Li;Jason J. Shieh;Alek C. Chen; Chih-Yu Chen; Philip C. W. Ng; Chun-Hung Liu; Yu-Tian Shen; Kuen-Yu Tsai; Jia-Han Li; Jason J. Shieh; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:50:34Z Direct-scatterometry-enabled optical-proximity-correction-model calibration Chih-Yu Chen;Philip C. W. Ng;Chun-Hung Liu;Yu-Tian Shen;Kuen-Yu Tsai;Jia-Han Li;Jason J. Shieh;Alek C. Chen; Chih-Yu Chen; Philip C. W. Ng; Chun-Hung Liu; Yu-Tian Shen; Kuen-Yu Tsai; Jia-Han Li; Jason J. Shieh; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:25:00Z Direct-scatterometry-enabled lithography model calibration Chih-Yu Chen;Kuen-Yu Tsai;Yu-Tian Shen;Yen-Min Lee;Jia-Han Li;Jason J. Shieh;Alek C. Chen; Chih-Yu Chen; Kuen-Yu Tsai; Yu-Tian Shen; Yen-Min Lee; Jia-Han Li; Jason J. Shieh; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:25:00Z Direct-scatterometry-enabled lithography model calibration Chih-Yu Chen;Kuen-Yu Tsai;Yu-Tian Shen;Yen-Min Lee;Jia-Han Li;Jason J. Shieh;Alek C. Chen; Chih-Yu Chen; Kuen-Yu Tsai; Yu-Tian Shen; Yen-Min Lee; Jia-Han Li; Jason J. Shieh; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:46:34Z Method for Calibrating A Manufacturing Process Model (National Taiwan University/ASML Holding N.V.) Kuen-Yu Tsai;Alek C. Chen;Jia-Han Li; Kuen-Yu Tsai; Alek C. Chen; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:46:34Z Method for Calibrating A Manufacturing Process Model (National Taiwan University/ASML Holding N.V.) Kuen-Yu Tsai;Alek C. Chen;Jia-Han Li; Kuen-Yu Tsai; Alek C. Chen; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:46:33Z Optical metrology of shape-varying nano-patterned gratings by analyzing the scattering signals in their pupil images Yen-Min Lee; Jia-Han Li; Fu-Min Wang; Hsin-Hung Cheng; Yu-Tian Shen; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:46:32Z Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:26Z Fabrication of metrology test structures with programmed line edge roughness using electron beam direct write Fu-Min Wang;Kuen-Yu Tsai;Jia-Han Li;Alek C. Chen;Yen-Min Lee;Yu-Tian Shen;Hsin-Hung Cheng;Chieh-Hsiang Kuan; Fu-Min Wang; Kuen-Yu Tsai; Jia-Han Li; Alek C. Chen; Yen-Min Lee; Yu-Tian Shen; Hsin-Hung Cheng; Chieh-Hsiang Kuan; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:26Z Fabrication of metrology test structures with programmed line edge roughness using electron beam direct write Fu-Min Wang;Kuen-Yu Tsai;Jia-Han Li;Alek C. Chen;Yen-Min Lee;Yu-Tian Shen;Hsin-Hung Cheng;Chieh-Hsiang Kuan; Fu-Min Wang; Kuen-Yu Tsai; Jia-Han Li; Alek C. Chen; Yen-Min Lee; Yu-Tian Shen; Hsin-Hung Cheng; Chieh-Hsiang Kuan; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:20Z Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Hang Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Hang Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:20Z Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Hang Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Hang Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:07Z Using transmission line theory to calculate equivalent refractive index of EUV mask multilayer structures for efficient scattering simulation by finite-difference time-domain method Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Han Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Han Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:07Z Using transmission line theory to calculate equivalent refractive index of EUV mask multilayer structures for efficient scattering simulation by finite-difference time-domain method Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Han Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Han Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:06Z A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows Philip C. W. Ng;Kuen-Yu Tsai;Yen-Min Lee;Ting-Han Pei;Fu-Min Wang;Jia-Han Li;Alek C. Chen; Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Ting-Han Pei; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:06Z A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows Philip C. W. Ng;Kuen-Yu Tsai;Yen-Min Lee;Ting-Han Pei;Fu-Min Wang;Jia-Han Li;Alek C. Chen; Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Ting-Han Pei; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏 2012-02 Electron-beam proximity effect model calibration for fabricating scatterometry calibration samples Chun-Hung Liu; Chih-Yu Chen; Hoi-Tou Ng; Kuen-Yu Tsai; Fu-Ming Wang; Chieh-Hsiung Kuan; Yen-Min Lee; Hsin-Hung Cheng; Jia-Han Li; Alek C. Chen; Yu-Tian Shen; KUEN-YU TSAI; CHIEH-HSIUNG KUAN et al.

Showing items 1-20 of 20  (1 Page(s) Totally)
1 
View [10|25|50] records per page