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"arikado t"
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| 國立交通大學 |
2014-12-08T15:11:06Z |
High density and low leakage current in TiO(2) MIM capacitors processed at 300 degrees C
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Cheng, C. H.; Lin, S. H.; Jhou, K. Y.; Chen, W. J.; Chou, C. P.; Yeh, F. S.; Hu, J.; Hwang, M.; Arikado, T.; McAlister, S. P. |
| 國立交通大學 |
2014-12-08T15:10:51Z |
Improvement of the performance of TiHfO MIM capacitors by using a dual plasma treatment of the lower electrode
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Cheng, C. H.; Pan, H. C.; Huang, C. C.; Chou, C. P.; Hsiao, C. N.; Hu, J.; Hwang, M.; Arikado, T.; McAlister, S. P.; Chin, Albert |
Showing items 1-2 of 2 (1 Page(s) Totally)
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