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Institution Date Title Author
國立成功大學 2002-07-15 Residual stress and fracture in thick tetraethylorthosilicate (TEOS) and silane-based PECVD oxide films Zhang, Xin; Chen, Kuo-Shen; Ghodssi, R.; Ayon, A. A.; Spearing, S. Mark
國立成功大學 2002-06 Effect of process parameters on the surface morphology and mechanical performance of silicon structures after deep reactive ion etching (DRIE) Chen, Kuo-Shen; Ayon, A. A.; Zhang, Xin; Spearing, S. Mark

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