臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

	English \| 正體中文 \| 简体中文 \| Total items :2822808
	Visitors : 29967868 Online Users : 928 Project Commissioned by the Ministry of Education Project Executed by National Taiwan University Library

Scope

Adv. Search

Login

Administrator

臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

About TAIR
	About TAIR

Browse By
	Institution
	Author
	Title
	Date
	Statistics Chart
	Institution Facts
	Trend

News
	2019臺灣學術機構典藏研討會
	機構典藏系統RC7版本已發佈

Copyright
	Publisher & Journal Policy
	TAIR Copyright Conference Minutes

Related Links
	機構典藏計畫網站
	ROAR
	OpenDOAR
	SHERPA
	OAIster
	JAIRO
	Ira
	DSPACE
	RWWR
	臺大學術典藏NTU Scholars

"c w yang"

Return to Browse by Author
Sorting by Title	Sort by Date

Showing items 11-17 of 17 (1 Page(s) Totally)
1
View [10|25|50] records per page

Institution	Date	Title	Author
南台科技大學	2003-01	Improvement the Short-Channel Characteristics of a 0.1um PMOSFET with Ultra-Low Temperature Nitride Spacer by using a novel Oxide Capping Boron Up-Hill Treatment	C. W. Yang; Y. K. Fang; C. H. Chen; W. D. Wang; S. F. Ting; S. F. Chen; J. Y. Cheng; M. F. Wang; C. L. Chen; L. G. Yao; T. L. Lee; S. C. Chen; C. H. Yu; M. S. Liang;陳世芳
南台科技大學	2003	Effect of polycrystailline-silicon gate types on the opposite flatband voltage shift in n-type and p-type metal-oxide-semiconductor field-effect transistor for high-k-HfO2 dielectric	C. W. Yang; Y. K. Fang; C. H. Chen; S. F. Chen; C. Y. Lin; C. S. Lin; M. F. Wang; Y. M. Lin; T. H. Hou; C. H. Chen; L. G. Yao; S. C. Chen; M. S. Liang;陳世芳
南台科技大學	2003	HfO2/HfSixOy high-k gate stack with very low leakage current for low-power poly-si gated CMOS application	C. W. Yang; Y. K. Fang; S. F. Chen; M. F. Wang; T.H.Hou; Y.M.Lin; L.G.Yao; S. C. Chen; M. S. Liang;陳世芳
國立中山大學	2003	Syntheses and X-ray structures of some pyrrolylaldiminate metal complexes	L.C. Liang; C.W. Yang; M.Y. Chiang; C.H. Hung; P.Y. Lee
南台科技大學	2002-05	Downscaling limit of equivalent oxide thickness in formation ofultrathin gate dielectric by thermal-enhanced remote plasma nitridation	C. H. Chen; Y. K. Fang; S. F. Ting; W. T. Hsieh; C. W. Yang; T. H. Hsu; M. C. Yu; T. L. Lee; S. C. Chen; C. H. Yu; M. S. Liang;陳順智;謝文哲
南台科技大學	2001-07	The Effect of Remote Plasma Nitridation on the Integrity of the Ultrathin Gate Dielectric Films in 0. 13mm CMOS Technology and Beyond	S. F. Ting; Y. K. Fang; C. H. Chen; C. W. Yang; W. T. Hsieh; J. J. Ho; M. C. Yu; S. M. Jang; C. H. Yu; M. S. Liang; S. Chen; R. Shih;謝文哲
國立臺灣海洋大學	2001-07	The Effect of Remote Plasma Nitridation on the Integrity of the Ultrathin Gate Dielectric Films in 0.13 m CMOS Technology and Beyond	S.F. Ting; Y.K. Fang; C.H. Chen; C.W. Yang; W.T. Hsieh; J.J. Ho; M.C. Yu; S.M. Jang; C.H. Yu; M.S. Liang; S. Chen; R. Shih

Showing items 11-17 of 17 (1 Page(s) Totally)
1
View [10|25|50] records per page