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机构 日期 题名 作者
中原大學 2010-08-01 High Aspect Ratio Contact Hole Etching using Relatively Transparent Amorphous Carbon Hard Mask Deposited from Propylene Ching-Yuan Ho;X. J. Lin; H. R. Chien; Chenhsin Lien
中原大學 2010-04 Gate Oxide Weat out Using Novel Polysilazane-base Inorganic as Nano-scaling Shallow Trench Filling Ching Yuan. Ho;Kai-Yao.Shih ; jr Hau He,
中原大學 2010 Investigation of Resistive Switching Behavior using Ti/ZnO Nanobelt/Ti for Non-Volatile Memory Application Ching-Yuan Ho; Chen-Fang Kang; Yen-Te Chiang ; Jr-Hau He
中原大學 2010 Study of Retention Characteristics and Program Speed Enhancement Using Plasma Nitridation on Inter-Poly Dielectric Ching Yuan Ho ; Chenhsin Lien
中原大學 2009-10 Selective Epitaxial Silicon Growth in High Aspect Ratio Contact on 70nm Node Flash Memory Ching-Yuan Ho;,Jr Hau He;Yuan-Pal Change;Chenhsin-Lien
中原大學 2009-08 Investigation of Gate Oxide Wear out Using Polysilazane-base Inorganic as Shallow Trench Filling Ching-Yuan. Ho; Kai-Yao. Shih; Jr Hau He
中原大學 2009-08 Development of Ohmic Nanocontacts Via Surface Modification for p-type Si Nanowire Arrays Shu-Sian Ciao; Ching-Yuan Ho; Jr-Hau He
中原大學 2009-08 Characteristics of Resistive Switching on ZnO Nanobelts Yen-De Chiang; Wen-Yuan Chang; Ching Yuan Ho; Tai-Bor Wu; Jr-Hau He
中原大學 2009-04-20 Influence of Rapid Thermal Annealing in N2 and Stacked-layer on SiO2-Al2O3-SiO2 Characteristics for Interpoly Silicon Dielectric Ching Yuan Ho; Chenhsin-Lien; C. H. Liu; Y. M. Lin; S. Pittikoun
中原大學 2009 Optimization of Interpoly Dielectric Using Plasma Nitridation and Wet Treatment for Future NAND Flash Ching Yuan Ho; Jr Hau He
中原大學 2009 ZnO Nanobelt as Resistive Switching Memory Ching Yuan Ho; Yen-De Chiang; Wen-Yuan Chang; Tai-Bor Wu; Jr-Hau He

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