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| 臺大學術典藏 |
2018-09-10T06:28:13Z |
Effect of Al incorporation in the thermal stability of atomic-layer-deposited HfO2 for gate dielectric applications
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MINGHWEI HONG; Hong, Minghwei; Kwo, Raynien; Wu, Tai-Bor; Chiou, Yan-Kai; Chang, Che-Hao; Wang, Chen-Chan; Lee, Kun-Yu |
| 臺大學術典藏 |
2018-09-10T06:28:12Z |
Advance in next Century nanoCMOSFET research
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Chiou, Yan-Kai; Chang, Che-Hao; Wang, Chen-Chan; Lee, Kun-Yu; Wu, Tai-Bor; Kwo, Raynien; Hong, Minghwei; Chang-Liao, Kuei-Shu; Lu, Chun-Yuan; others; MINGHWEI HONG; Hwang, Huey-Liang |
| 國立交通大學 |
2014-12-08T15:05:21Z |
Advance in next Century nanoCMOSFET research
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Hwang, Huey-Liang; Chiou, Yan-Kai; Chang, Che-Hao; Wang, Chen-Chan; Lee, Kun-Yu; Wu, Tai-Bor; Kwo, Raynien; Hong, Minghwei; Chang-Liao, Kuei-Shu; Lu, Chun-Yuan; Lu, Chun-Chang; Chiu, Fu-Chien; Chen, Chun-Heng; Lee, Joseph Ya-Min; Chin, Albert |
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