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Institution Date Title Author
臺大學術典藏 2018-09-10T06:28:13Z Effect of Al incorporation in the thermal stability of atomic-layer-deposited HfO2 for gate dielectric applications MINGHWEI HONG; Hong, Minghwei; Kwo, Raynien; Wu, Tai-Bor; Chiou, Yan-Kai; Chang, Che-Hao; Wang, Chen-Chan; Lee, Kun-Yu
臺大學術典藏 2018-09-10T06:28:12Z Advance in next Century nanoCMOSFET research Chiou, Yan-Kai; Chang, Che-Hao; Wang, Chen-Chan; Lee, Kun-Yu; Wu, Tai-Bor; Kwo, Raynien; Hong, Minghwei; Chang-Liao, Kuei-Shu; Lu, Chun-Yuan; others; MINGHWEI HONG; Hwang, Huey-Liang
國立交通大學 2014-12-08T15:05:21Z Advance in next Century nanoCMOSFET research Hwang, Huey-Liang; Chiou, Yan-Kai; Chang, Che-Hao; Wang, Chen-Chan; Lee, Kun-Yu; Wu, Tai-Bor; Kwo, Raynien; Hong, Minghwei; Chang-Liao, Kuei-Shu; Lu, Chun-Yuan; Lu, Chun-Chang; Chiu, Fu-Chien; Chen, Chun-Heng; Lee, Joseph Ya-Min; Chin, Albert

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