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Showing items 116-140 of 152  (7 Page(s) Totally)
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Institution Date Title Author
國立臺灣科技大學 2011 Highly stable carbon-doped Cu films on barrierless Si Zhang, X.Y.;Li, X.N.;Nie, L.F.;Chu, J.P.;Wang, Q.;Lin, C.H.;Dong, C.
國立臺灣科技大學 2010 Thermal performance of a new Cu alloy film for advanced interconnects Lin C.H.; Chu J.P.; Leau W.K.
國立臺灣科技大學 2010 Electrosynthesis and studies on Cadmium-Indium-Selenide thin films Mahalingam T.; Thanikaikarasan S.; Chandramohan R.; Chung K.; Chu J.P.; S.velumani; Rhee J.-K.
國立臺灣科技大學 2010 The preparation for Cu(Sn) films of barrierless interconnection Xu L.; Li X.; Chu J.P.; Dong C.
國立臺灣科技大學 2010 Sputter-deposited Cu/Cu(O) multilayers exhibiting enhanced strength and tunable modulus Chu J.P.; Wang Y.-C.
國立臺灣科技大學 2010 Novel Cu-RuNx composite layer with good solderability and very low consumption rate Chuang H.Y.; Lin C.H.; Chu J.P.; Kao C.R.
國立臺灣科技大學 2010 Effect of deposition potential on the physical properties of electrodeposited CuO thin films Mahalingam T.; Dhanasekaran V.; Ravi G.; Lee S.; Chu J.P.; Lim H.-J.
國立臺灣科技大學 2010 Ultrathin diffusion barrier for copper metallization: A thermally stable amorphous rare-earth scandate Chu J.P.; Yu T.Y.; Wu C.H.; Lin C.H.; Wang S.F.; Chen Q.
國立臺灣科技大學 2010 High thermal stability and low electrical resistivity carbon-containing Cu film on barrierless Si Nie L.F.; Li X.N.; Chu J.P.; Wang Q.; Lin C.H.; Dong C.
國立臺灣科技大學 2010 Thin film metallic glasses: Preparations, properties, and applications Chu, J.P.;Huang, J.C.;Jang, J.S.C.;Wang, Y.C.;Liaw, P.K.
國立臺灣科技大學 2010 CHARACTERIZATION OF ELECTRODEPOSITED INDIUM DOPED CdSe THIN FILMS Mahalingam, T.;Mariappan, R.;Dhanasekaran, V.;Mohan, S.M.;Ravi, G.;Chu, J.P.
國立臺灣科技大學 2010 Characterization of nanoindentation damage in metal/ceramic multilayered films by transmission electron microscopy (TEM) Sun, P.L.;Chu, J.P.;Lin, T.Y.;Shen, Y.L.;Chawla, N.
國立臺灣科技大學 2010 Indentation Behavior of Zr-Based Metallic-Glass Films via Molecular-Dynamics Simulations Wang, Y.C.;Wu, C.Y.;Chu, J.P.;Liaw, P.K.
國立臺灣大學 2010 Novel Cu-RuNx composite layer with good solderability and very low consumption rate Chuang, H.Y.; Lin, C.H.; Chu, J.P.; Kao, C.R.
國立臺灣科技大學 2009 Thermal stability study of Cu(MoN x ) seed layer on barrierless Si Chu J.P.; Lin C.H.; Leau W.K.; John V.S.
國立臺灣科技大學 2009 On the amorphous and nanocrystalline Zr-Cu and Zr-Ti co-sputtered thin films Chen C.J.; Huang J.C.; Chou H.S.; Lai Y.H.; Chang L.W.; Du X.H.; Chu J.P.; Nieh T.G.
國立臺灣科技大學 2009 Annealing-induced amorphization in a glass-forming thin film Chu J.P.
國立臺灣科技大學 2009 Study of the characteristics and corrosion behavior for the Zr-based metallic glass thin film fabricated by pulse magnetron sputtering process Chu C.W.; Jang J.S.C.; Chiu S.M.; Chu J.P.
國立臺灣科技大學 2009 Amorphous and nanocrystalline sputtered Mg-Cu thin films Chou H.S.; Huang J.C.; Lai Y.H.; Chang L.W.; Du X.H.; Chu J.P.; Nieh T.G.
國立臺灣科技大學 2009 Thermal Stability Study of Cu(MoNx) Seed Layer on Barrierless Si Chu, J.P.;Lin, C.H.;Leau, W.K.;John, V.S.
國立臺灣科技大學 2009 Cu(ReNx) for Advanced Barrierless Interconnects Stable Up To 730 degrees C Chu, J.P.;Lin, C.H.;Sun, P.L.;Leau, W.K.
國立臺灣科技大學 2009 Recent progress in metallic glasses in Taiwan Huang, J.C.;Chu, J.P.;Jang, J.S.C.
國立臺灣科技大學 2009 Electrical and Reliability Characteristics of Barrierless Cu-Based Contact for High Dielectric Constant Oxide Thin-Film Device Integration Wu, C.H.;Chu, J.P.;Lin, C.H.;Wang, S.F.
國立臺灣科技大學 2008 High performance Cu containing Ru or RuNX for barrierless metallization Chu J.P.; Lin C.H.
國立臺灣科技大學 2008 Novel CU alloy seed layers for barrierless metallization Chu J.P.; Lin C.H.

Showing items 116-140 of 152  (7 Page(s) Totally)
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