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Institution Date Title Author
臺大學術典藏 2018-09-10T07:29:09Z Constant bias-temperature and constant charge-temperature agings for silicon oxide films of MOS devices Hwu, J.-G.;Chuang, J.-B.;Fu, S.-L.; Hwu, J.-G.; Chuang, J.-B.; Fu, S.-L.; JENN-GWO HWU
國立臺灣大學 1989 Constant Bias-Temperature and Constant Charge-Temperature Agings for Silicon Oxide Films of MOS Devices 胡振國; Chuang, J. B.; Fu, S. J.; Hwu, Jenn-Gwo; Chuang, J. B.; Fu, S. J.

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