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Showing items 1-13 of 13 (1 Page(s) Totally) 1 View [10|25|50] records per page
東吳大學 |
2017 |
平行時空裡的中國國族主義—以敘事批評分析方法看 2015 馬習會
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莊凱傑; CHUANG, KAI-CHIEH |
國立成功大學 |
2016-08-02 |
氮化鎵/氮化鋁鎵蕭特基接觸場效應元件之研製
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莊凱傑; Chuang, Kai-Chieh |
國立成功大學 |
2016-07-21 |
氮化鎵/氮化鋁鎵蕭特基接觸場效應元件之研製
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莊凱傑; Chuang, Kai-Chieh |
國立高雄第一科技大學 |
2013/10/21 |
運用Drupal建置網站之方法論
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莊凱傑; Chuang, Kai-chieh |
國立臺灣大學 |
2010 |
以陽極氧化技術在矽及碳化矽基板上備製超薄閘極介電層之研究
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莊凱傑; Chuang, Kai-Chieh |
國立臺灣大學 |
2009 |
Thin Silicon Oxide Films on N-type 4H-SiC Prepared by Scanning Frequency Anodization Method
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Chuang, Kai-Chieh; Hwu, Jenn-Gwo |
國立臺灣大學 |
2009 |
Characterization of Inversion Tunneling Current Saturation Behavior for MOS(p) Capacitors with Ultra-thin Oxides and High-k Dielectrics
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Chen, Chih-Hao; Chuang, Kai-Chieh; Hwu, Jenn-Gwo |
國立臺灣大學 |
2008 |
Effect of strain-temperature stress on MOS structure with ultra-thin gate oxide
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Lin, Chia-Nan; Yang, Yi-Lin; Chen, Wei-Ting; Lin, Shang-Chih; Chuang, Kai-Chieh; Hwu, Jenn-Gwo |
國立臺灣大學 |
2008 |
Ultrathin Gate Oxides Prepared by Tensile-Stress Oxidation in Tilted Cathode Anodization System
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Wang, Chih-Ching; Li, Tsung-Hung; Chuang, Kai-Chieh; Hwu, Jenn-Gwo |
國立臺灣大學 |
2008 |
Silicon Oxide Gate Dielectric on N-Type 4H-SiC Prepared by Low Thermal Budget Anodization Method
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Chuang, Kai-Chieh; Hwu, Jenn-Gwo |
國立成功大學 |
2007-06-01 |
摩擦攪拌製程對AZ31鎂合金拉伸及振動破壞特性影響之研究
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莊凱傑; Chuang, Kai-Chieh |
國立成功大學 |
2007-06-01 |
摩擦攪拌製程對AZ31鎂合金拉伸及振動破壞特性影響之研究
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莊凱傑; Chuang, Kai-Chieh |
國立臺灣大學 |
2006 |
Improvement in electrical characteristics of high-k Al2O3 gate dielectric by field-assisted nitric oxidation
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Chuang, Kai-Chieh; Hwu, Jenn-Gwo |
Showing items 1-13 of 13 (1 Page(s) Totally) 1 View [10|25|50] records per page
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