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Showing items 11-20 of 46  (5 Page(s) Totally)
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Institution Date Title Author
臺大學術典藏 2018-09-10T09:50:33Z Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam-direct-write lithography Chun-Hung Liu;Philip C. W. Ng;Yu-Tian Shen;Sheng-Wei Chien;Kuen-Yu Tsai; Chun-Hung Liu; Philip C. W. Ng; Yu-Tian Shen; Sheng-Wei Chien; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:25:00Z New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints Hoi-Tou Ng;Yu-Tian Shen;Sheng-Yung Chen;Chun-Hung Liu;Philip C. W. Ng;Kuen-Yu Tsai; Hoi-Tou Ng; Yu-Tian Shen; Sheng-Yung Chen; Chun-Hung Liu; Philip C. W. Ng; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T09:24:59Z New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithography Chun-Hung Liu;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:46:34Z Method and System for Establishing Parametric Model (參數化模型的建立方法及系統) Kuen-Yu Tsai;Chun-Hung Liu; Kuen-Yu Tsai; Chun-Hung Liu; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:46:33Z Lithography-patterning-fidelity-aware electron-optical system design optimization Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Chun-Hung Liu; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:22Z Impacts of point spread function calibration methods on model-based proximity effect correction for electron-beam-direct-write lithography Chun-Hung Liu;Philip Ng;Yu-Tian Shen;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Philip Ng; Yu-Tian Shen; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T08:18:21Z Model-based proximity effect correction for electron-beam direct-write lithography Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu;Pei-Lin Tien;Philip C. W. Ng;Yu-Tian Shen;Kuen-Yu Tsai; Chun-Hung Liu; Pei-Lin Tien; Philip C. W. Ng
臺大學術典藏 2018-09-10T07:42:07Z Determination of Gaussian beam and raster scan parameters in electron-beam-direct-write lithography considering device patterning and performance variability Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng; Chun-Hung Liu; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:06Z A new parametric proximity effect model calibration method for improving accuracy of post-lithography patterning prediction in sub-32-nm half-pitch low-voltage electron beam direct-write lithography Chun-Hung Liu;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏 2018-09-10T07:42:05Z Selection of Gaussian-beam and raster-scan parameters in electron-beam direct-write lithography considering device patterning and performance variability Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu; Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng

Showing items 11-20 of 46  (5 Page(s) Totally)
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