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臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)
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Institution Date Title Author
國立成功大學 2011-07-15 Fabrication of enhanced anodic aluminum oxide performance at room temperatures using hybrid pulse anodization with effective cooling Chung, C. K.; Chang, W. T.; Liao, M. W.; Chang, H. C.; Lee, C. T.
國立成功大學 2011-07 Effect of sol-gel composition ratio and laser power on phase transformation of crystalline titanium dioxide under CO(2) laser annealing Chung, C. K.; Lin, S. L.; Cheng, S. Y.; Chuang, K. P.; Wang, H. Y.
國立成功大學 2011-06 On the fabrication of minimizing bulges and reducing the feature dimensions of microchannels using novel CO(2) laser micromachining Chung, C. K.; Lin, S. L.
國立成功大學 2011-05-31 Effect of pulse voltage and aluminum purity on the characteristics of anodic aluminum oxide using hybrid pulse anodization at room temperature Chung, C. K.; Chang, W. T.; Liao, M. W.; Chang, H. C.
國立成功大學 2011-05-31 Effect of reactive gases flow ratios on the microstructure and electrical resistivity of Ta-N-O thin films by reactive co-sputtering Chung, C. K.; Chen, T. S.; Chang, N. W.
國立成功大學 2011-04-01 Design and experiments of a short-mixing-length baffled microreactor and its application to microfluidic synthesis of nanoparticles Chung, C. K.; Shih, T. R.; Chang, C. K.; Lai, C. W.; Wu, B. H.
國立成功大學 2011-02-15 Effect of temperature on the evolution of diffusivity, microstructure and hardness of nanocrystalline nickel films electrodeposited at low temperatures Chung, C. K.; Chang, W. T.; Chen, C. F.; Liao, M. W.
國立成功大學 2011-01-31 On work function and characteristics of anomalous electrodeposited nickel-cobalt films Chung, C. K.; Chang, W. T.; Liao, M. W.
國立臺灣大學 2011 The orientation relationship between Ni and Cu6Sn5 formed during the soldering reaction Chen, W.M.; Yang, T.L.; Chung, C.K.; Kao, C.R.
國立成功大學 2007-06-12 Fabrication of wedge-shape tool via electrochemical micromachining with diamond-like carbon coating Wang, Jiunn-Jyh Junz; Chung, C. K.; Wu, Bo-Hsiung; Liao, Yong-Yuan
國立臺灣科技大學 2005 Fabrication and characterization of amorphous Si films by PECVD for MEMS Chung, C.K.;Tsai, M.Q.;Tsai, P.H.;Lee, C.

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