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Institution Date Title Author
臺大學術典藏 2020-01-06T03:08:39Z Comparison of model and experiment for Ar, Ar/O2 and Ar/O 2/Cl2 inductively coupled plasmas Hsu, C.-C.; Nierode, M.A.; Coburn, J.W.; Graves, D.B.; JERRY CHENG-CHE HSU
臺大學術典藏 2020-01-06T03:08:39Z Etching of ruthenium coatings in O 2- and Cl 2- containing plasmas Hsu, C.C.; Coburn, J.W.; Graves, D.B.; JERRY CHENG-CHE HSU

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