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Showing items 26-30 of 30 (2 Page(s) Totally)
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| 國立虎尾科技大學 |
2007 |
Bimetallic oxide nanoparticles CoxMoyO as charge trapping layer for nonvolatile memory device applications
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Liu, Chien-Wei;Cheng, Chin-Lung;Huang, Sung-Wei;Jeng, Jin-Tsong;Shiau, Shiuan-Hua;Dai, Bau-Tong |
| 國立虎尾科技大學 |
2007 |
Bimetallic oxide nanoparticles CoxMoyO as charge trapping layer for nonvolatile memory device applications
|
Liu, Chien-Wei;Cheng, Chin-Lung;Huang, Sung-Wei;Jeng, Jin-Tsong;Shiau, Shiuan-Hua;Dai, Bau-Tong |
| 國立成功大學 |
2003-11-15 |
The application of electrochemical metrologies for investigating chemical mechanical polishing of Al with a Ti barrier layer
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Chiu, Shao-Yu; Wang, Ying-Lang; Liu, Chuan-Pu; Lan, Jin-Kun; Ay, Chyung; Feng, Ming-Shiann; Tsai, Ming-Shih; Dai, Bau-Tong |
| 國立成功大學 |
2002-07 |
Modifications of low dielectric constant fluorinated amorphous carbon films by multiple plasma treatments
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Shieh, Jia-Min; Tsai, Kou-Chiang; Dai, Bau-Tong; Lee, Shih-Chin; Ying, Chih-Hung; Fang, Yan-Kun |
| 中原大學 |
2001-04 |
Evaluation of Process Variables in Plasma Deposition of Low-k Dielectrics Using the Experimental Designs Methodology
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Wei, Ta-Chin;Liu, Chi-Hung;Yang, Jung-Yen;Lin, Fu-Lin;Huang, Chun-Kai;Dai, Bau-Tong |
Showing items 26-30 of 30 (2 Page(s) Totally)
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