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机构 日期 题名 作者
國立交通大學 2014-12-08T15:42:45Z The removal selectivity of titanium and aluminum in chemical mechanical planarization Hsu, JW; Chiu, SY; Wang, YL; Dai, BT; Tsai, MS; Feng, MS; Shih, HC
國立交通大學 2014-12-08T15:42:28Z Electroplating copper in sub-100 nm gaps by additives with low consumption and diffusion ability Lin, KC; Shieh, JM; Chang, SC; Dai, BT; Chen, CF; Feng, MS
國立交通大學 2014-12-08T15:42:21Z Investigation of inductively coupled plasma gate oxide on low temperature polycrystalline-silicon TFTs Tseng, CH; Chang, TK; Chu, FT; Shieh, JM; Dai, BT; Cheng, HC; Chin, A
國立交通大學 2014-12-08T15:42:19Z Reduction of resistivity of electroplated copper by rapid thermal annealing Chang, SC; Shieh, JM; Dai, BT; Feng, MS
國立交通大學 2014-12-08T15:42:15Z Reduction of etching plasma damage on low dielectric constant fluorinated amorphous carbon films by multiple H-2 plasma treatment Shieh, JM; Tsai, KC; Dai, BT; Wu, YC; Wu, YH
國立交通大學 2014-12-08T15:42:14Z Wetting effect on gap filling submicron damascene by an electrolyte free of levelers Chang, SC; Shieh, JM; Lin, KC; Dai, BT; Wang, TC; Chen, CF; Feng, MS; Li, YH; Lu, CP
國立交通大學 2014-12-08T15:42:09Z Investigation of superfilling and electrical characteristics in low-impurity-incorporated Cu metallization Shieh, JM; Chang, SC; Dai, BT; Feng, MS
國立交通大學 2014-12-08T15:42:01Z The effect of plating current densities on self-annealing Behaviors of electroplated copper films Chang, SC; Shieh, JM; Dai, BT; Feng, MS; Li, YH
國立交通大學 2014-12-08T15:42:00Z Microleveling mechanisms and applications of electropolishing on planarization of copper metallization Chang, SC; Shieh, JM; Huang, CC; Dai, BT; Li, YH; Feng, MS
國立交通大學 2014-12-08T15:41:49Z Leveling effects of copper electrolytes with hybrid-mode additives Lin, KC; Shieh, JM; Chang, SC; Dai, BT; Chen, CF; Feng, MS; Li, YH
國立交通大學 2014-12-08T15:41:48Z Investigation of carrying agents on microstructure of electroplated Cu films Shieh, JM; Chang, SC; Dai, BT; Feng, MS
國立交通大學 2014-12-08T15:41:47Z Investigations of pulse current electrodeposition for damascene copper metals Chang, SC; Shieh, JM; Dai, BT; Feng, MS
國立交通大學 2014-12-08T15:41:39Z Pattern effects on planarization efficiency of Cu electropolishing Chang, SC; Shieh, JM; Huang, CC; Dai, BT; Feng, MS
國立交通大學 2014-12-08T15:41:17Z Improving the quality of electroplated copper films by rapid thermal annealing Chang, SC; Shieh, JM; Dai, BT; Feng, MS; Wang, YL
國立交通大學 2014-12-08T15:40:54Z Superpolishing for planarizing copper damascene interconnects Chang, SC; Shieh, JM; Dai, BT; Feng, MS; Li, YH; Shih, CH; Tsai, MH; Shue, SL; Liang, RS; Wang, YL
國立交通大學 2014-12-08T15:40:06Z The application of electrochemical metrologies for investigating chemical mechanical polishing of Al with a Ti barrier layer Chiu, SY; Wang, YL; Liu, CP; Lan, JK; Ay, C; Feng, MS; Tsai, MS; Dai, BT
國立交通大學 2014-12-08T15:39:57Z Roles of copper mechanical characteristics in electropolishing Chang, SC; Shieh, JM; Fang, JY; Wang, YL; Dai, BT; Feng, MS
國立交通大學 2014-12-08T15:39:46Z Stable blue luminescence from mesoporous silica films Shieh, JM; Cho, AT; Lai, YF; Dai, BT; Pan, FM; Chao, KJ
國立交通大學 2014-12-08T15:39:45Z Synthesis of microcrystalline silicon at room temperature using ICP Wu, JH; Shieh, JM; Dai, BT; Wu, YCS
國立交通大學 2014-12-08T15:39:17Z The removal of airborne molecular contamination in cleanroom using PTFE and chemical filters Yeh, CF; Hsiao, CW; Lin, SJ; Hsieh, CM; Kusumi, T; Aomi, H; Kaneko, H; Dai, BT; Tsai, MS
國立交通大學 2014-12-08T15:38:41Z Near-infrared femtosecond laser-induced crystallization of amorphous silicon Shieh, JM; Chen, ZH; Dai, BT; Wang, YC; Zaitsev, A; Pan, CL
國立交通大學 2014-12-08T15:37:19Z Post-Cu CMP cleaning for colloidal silica abrasive removal Chen, PL; Chen, JH; Tsai, MS; Dai, BT; Yeh, CF
國立交通大學 2014-12-08T15:36:01Z Pattern effect optimized with non-native surface passivation in copper abrasive-free polishing Fang, JY; Tsai, MS; Dai, BT; Wu, YS; Feng, MS
國立交通大學 2014-12-08T15:36:01Z Emission of bright blue light from mesoporous silica with dense Si (Ge) nanocrystals Cho, AT; Shieh, JM; Shieh, J; Lai, YF; Dai, BT; Pan, FM; Kuo, HC; Lin, YC; Chao, KJ; Liu, PH
國立交通大學 2014-12-08T15:36:00Z Two-additive electrolytes for superplanarizing damascene Cu metals Liu, SH; Shieh, JM; Chen, C; Dai, BT; Hensen, K; Cheng, SS

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