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臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)
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Institution Date Title Author
國立交通大學 2014-12-08T15:44:41Z Characterization of additive systems for damascene Cu electroplating by the superfilling profile monitor Chiu, SY; Shieh, JM; Chang, SC; Lin, KC; Dai, BT
國立交通大學 2014-12-08T15:43:56Z Characteristics of fluorinated amorphous carbon films and implementation of 0.15 mu m Cu/a-C : F damascene interconnection Shieh, JM; Suen, SC; Tsai, KC; Dai, BT; Wu, YC; Wu, YH
國立交通大學 2014-12-08T15:43:54Z Investigations of effects of bias polarization and chemical parameters on morphology and filling capability of 130 nm damascene electroplated copper Chang, SC; Shieh, JM; Lin, KC; Dai, BT; Wang, TC; Chen, CF; Feng, MS; Li, YH; Lu, CP
國立交通大學 2014-12-08T15:43:39Z Selective copper metallization by electrochemical contact displacement with amorphous silicon film Lee, YP; Tsai, MS; Hu, TC; Dai, BT; Feng, MS
國立交通大學 2014-12-08T15:42:47Z Electrochemical behavior of copper chemical mechanical polishing in KIO3 slurry Hsu, JW; Chiu, SY; Tsai, MS; Dai, BT; Feng, MS; Shih, HC
國立交通大學 2014-12-08T15:42:45Z The removal selectivity of titanium and aluminum in chemical mechanical planarization Hsu, JW; Chiu, SY; Wang, YL; Dai, BT; Tsai, MS; Feng, MS; Shih, HC
國立交通大學 2014-12-08T15:42:28Z Electroplating copper in sub-100 nm gaps by additives with low consumption and diffusion ability Lin, KC; Shieh, JM; Chang, SC; Dai, BT; Chen, CF; Feng, MS
國立交通大學 2014-12-08T15:42:21Z Investigation of inductively coupled plasma gate oxide on low temperature polycrystalline-silicon TFTs Tseng, CH; Chang, TK; Chu, FT; Shieh, JM; Dai, BT; Cheng, HC; Chin, A
國立交通大學 2014-12-08T15:42:19Z Reduction of resistivity of electroplated copper by rapid thermal annealing Chang, SC; Shieh, JM; Dai, BT; Feng, MS
國立交通大學 2014-12-08T15:42:15Z Reduction of etching plasma damage on low dielectric constant fluorinated amorphous carbon films by multiple H-2 plasma treatment Shieh, JM; Tsai, KC; Dai, BT; Wu, YC; Wu, YH

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