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Showing items 51-56 of 56 (3 Page(s) Totally)
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| 國立交通大學 |
2014-12-08T15:02:50Z |
Post cleaning of chemical mechanical polishing process
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Liu, CW; Dai, BT; Yeh, CF |
| 國立交通大學 |
2014-12-08T15:02:49Z |
Fabrication of thin film transistors by chemical mechanical polished polycrystalline silicon films
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Chang, CY; Lin, HY; Lei, TF; Cheng, JY; Chen, LP; Dai, BT |
| 國立交通大學 |
2014-12-08T15:02:33Z |
A novel technology to reduce the antenna charging effects during polysilicon gate electron-cyclotron-resonance etching
|
Cheng, HC; Kang, TK; Ku, TK; Dai, BT; Chen, LP |
| 國立交通大學 |
2014-12-08T15:02:11Z |
Effects of mechanical characteristics on the chemical-mechanical polishing of dielectric thin films
|
Tseng, WT; Liu, CW; Dai, BT; Yeh, CF |
| 國立交通大學 |
2014-12-08T15:01:16Z |
Charging damages to gate oxides in a helicon O-2 plasma
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Lin, W; Kang, TK; Perng, YC; Dai, BT; Cheng, HC |
| 國立屏東大學 |
2008 |
Influence of mask magnification effects on the diffracted light and lithographic imaging for EUV phase shifting mask
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張雯惠;CH*, Lin;Shieh, J;Chang, WH;Dai, BT. |
Showing items 51-56 of 56 (3 Page(s) Totally)
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