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| 國立交通大學 |
2019-04-02T05:57:53Z |
Lanthanide-Oxides Mixed TiO2 Dielectrics for High-kappa MIM Capacitors
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Cheng, C. H.; Deng, C. K.; Hsu, H. H.; Chen, P. C.; Liou, B. H.; Chin, Albert; Yeh, F. S. |
| 國立交通大學 |
2014-12-08T15:12:25Z |
The electrical characteristics of high-kappa Pr2O3 thin-film transistors with nitrogen-implanted polysilicon films
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Deng, C. -K.; Chang, H. -R.; Chiou, B. -S. |
| 國立交通大學 |
2014-12-08T15:07:53Z |
High-kappa TiCeO MIM Capacitors with a Dual-Plasma Interface Treatment
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Cheng, C. H.; Hsu, H. H.; Hsieh, I. J.; Deng, C. K.; Chin, Albert; Yeh, F. S. |
| 國立交通大學 |
2014-12-08T15:07:52Z |
Lanthanide-Oxides Mixed TiO(2) Dielectrics for High-kappa MIM Capacitors
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Cheng, C. H.; Deng, C. K.; Hsu, H. H.; Chen, P. C.; Liou, B. H.; Chin, Albert; Yeh, F. S. |
| 國立交通大學 |
2014-12-08T15:01:18Z |
Improved Lower Electrode Oxidation of High-kappa TiCeO Metal-Insulator-Metal Capacitors by Using a Novel Plasma Treatment
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Cheng, C. H.; Hsu, H. H.; Deng, C. K.; Chin, Albert; Chou, C. P. |
Showing items 1-5 of 5 (1 Page(s) Totally)
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