臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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	Repositories
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	2019臺灣學術機構典藏研討會
	機構典藏系統RC7版本已發佈

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Institution	Date	Title	Author
中原大學	2001-06-19	Method of fabricating a self-aligned contact	Chien-Sheng Hsieh;Wei-Ray Lin;Fu-Liang Yang;Erik S. Jeng;Bor-Ru Sheu
中原大學	2001-06-12	Method for producing multi-level contacts	Bi-Ling Chen;Erik S. Jeng;Shih-Ming Chang
中原大學	2001-05-29	Method of self-aligned contact hole etching by fluorine-containing discharges	Erik S. Jeng;Bi-Ling Chen
中原大學	2001-05-22	Method for forming a semiconductor device	Erik S. Jeng;Tzu-Shih Yen;Chi-San Wu;Jong-Bor Wang
中原大學	2001-04-24	Anti-reflection oxynitride film for polysilicon substrates	Liang-Gi Yao;John Chin-Hsiang Lin;Hua-Tai Lin;Erik S. Jeng;Hsiao-Chin Tuan
中原大學	2001-02-06	Method of fabricating a capacitor under bit line DRAM structure using contact hole liners	Erik S. Jeng;Bi-Ling Chen;Wei-Ray Lin;Yu-Chun Ho;Ming-Hong Kuo
中原大學	2001-01-30	Formation of finely controlled shallow trench isolation for ULSI process	Fu-Liang Yang;Bih-Tiao Lin;Wei-Ray Lin;Erik S. Jeng
中原大學	2001-01-23	DRAM using oxide plug in bitline contacts during fabrication	Erik S. Jeng
中原大學	2001-01-02	Method for fabricating crown-shaped capacitor structures	Erik S. Jeng;Ing-Ruey Liaw;Rong-Wu Chien
中原大學	2000-12-12	Method for fabricating borderless and self-aligned polysilicon and metal contact landing plugs for multilevel interconnections	Erik S. Jeng;Bi-Ling Chen;Chien-Sheng Hsieh
中原大學	2000-11-21	Method of forming a cob dram by using self-aligned node and bit line contact plug	Hung-Yi Luo;Erik S. Jeng;Yue-Feng Chen
中原大學	2000-10-31	Method for eliminating CMP induced microscratches	Fu-Liang Yang;Bih-Tiao Lin;Tzu-Shih Yen;Bi-Ling Chen;Erik S. Jeng
中原大學	2000-10-24	Method for fabricating capacitor-over-bit-line dynamic random access memory (DRAM) using self-aligned contact etching technology	Erik S. Jeng;Chun-Yao Chen;Ing-Ruey Liaw;Janmye Sung
中原大學	2000-10-24	Method to fabricate capacitor structures with very narrow features using silyated photoresist	Tzu-Shih Yen;Erik S. Jeng
中原大學	2000-09-26	Method for fabricating ultra-small interconnections using simplified patterns and sidewall contact plugs	Erik S. Jeng;Tzu-Shih Yen;Hung-Yi Luo
中原大學	2000-08-15	Method of forming a contact hole in a semiconductor device	Erik S. Jeng;Bi-Ling Chen;Hao-Chieh Liu
中原大學	2000-06-27	Method for fabricating interconnection and capacitors of a DRAM using a simple geometry active area, self-aligned etching, and polysilicon plugs	Erik S. Jeng
中原大學	2000-06-27	Method for forming multi-level contacts using a H-containing fluorocarbon chemistry	Bi-Ling Chen;Erik S. Jeng;Hao-Chieh Liu
中原大學	2000-06-13	Method for forming multi-level contacts	Hao-Chieh Liu;Erik S. Jeng;Bi-Ling Chen;Wan-Yih Lien
中原大學	2000-06-06	Method for simultaneously fabricating a DRAM capacitor and metal interconnections	Fu-Liang Yang;Erik S. Jeng;Bih-Tiao Lin;I-Ping Lee
中原大學	2000-05-09	Method to fabricate isolation by combining locos and shallow trench isolation for ULSI technology	Fu-Liang Yang;Wei-Ray Lin;Ming-Hong Kuo;Erik S. Jeng
中原大學	2000-05-02	Method for etching a metal layer with dimensional control	I-Ping Lee;Erik S. Jeng;Chyei-Jer Hsieh
中原大學	2000-03-14	Method for improving patterning of a conductive layer in an integrated circuit	Hua-Tai Lin;Erik S. Jeng;Liang-Gi Yao
中原大學	2000-03-14	Method of fabricating contact holes in high density integrated circuits using polysilicon landing plug and self-aligned etching processes	Erik S. Jeng;Yue-Feng Chen;Bi-Ling Chen
中原大學	2000-03-07	Method of fabricating sidewall spacers for a self-aligned contact hole	Erik S. Jeng;Hung-Yi Luo;Yue-Feng Chen;Ming-Horn Tsai

Showing items 11-35 of 48 (2 Page(s) Totally)
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