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机构 日期 题名 作者
臺大學術典藏 2018-09-10T07:42:40Z Silicon-Oxynitride Films Prepared for 157 nm Attenuated Phase Shifting Masks H. L. Chen; F. D. Lai; L. A. Wang; LON A. WANG
臺大學術典藏 2018-09-10T04:59:41Z Design of a tri-layer bottom anti-reflective coating for KrF, ArF and F2 lithographies W. C. Cheng; F. D. Lai; H. M. Huang; L. A. Wang; LON A. WANG
臺大學術典藏 2018-09-10T04:35:52Z Ultrathin TiO2 amorphous films for high transmittance APSM blanks at 157 and 193 nm wavelength simultaneously F. D. Lai,; C. M. Chang,; L. A. Wang,; T. S. Yih,; LON A. WANG
臺大學術典藏 2018-09-10T04:15:34Z Design of (ZrO2)x/(Cr2O3)y/(Al2O3)1-x-y superlattices for high transmittance APSM at 193 nm wavelength F. D. Lai; L. A. Wang; LON A. WANG
臺大學術典藏 2018-09-10T04:15:33Z Fabrication and Characterization of Aluminum Oxide/Chromium Oxide Optical Superlattice for APSM at 193nm Wavelength F. D. Lai; L. A. Wang; LON A. WANG
臺大學術典藏 2018-09-10T03:50:48Z Optical-Constant Tunable (ZrO2)x/(Cr2O3)y/(Al2O3)1-x-y Optical Superlattice for APSM in ArF Lithography F. D. Lai; L. A. Wang; LON A. WANG
臺大學術典藏 2018-09-10T03:50:48Z Design of (ZrO2)x/(Cr2O3)y/(Al2O3)1-x-y Superlattice for High Transmittance APSM at 193nm Wavelength F. D. Lai; L. A. Wang; LON A. WANG
臺大學術典藏 2018-09-10T03:50:48Z Optical-constant Tunable AlO/CrO/ZrO Optical Superlattices for APSM working in ArF Lithography L. A. Wang; F.D. Lai; LON A. WANG
臺大學術典藏 2018-09-10T03:50:47Z Optical properties of CrO/ZrO optical superlattice for attenuated phase shifting mask at 193 nm wavelength F. D. Lai; L. A. Wang; LON A. WANG
國立高雄第一科技大學 2004.06 Design of a tri-layer bottom anti-reflective coating for KrF, ArF and F2 lithographies W.C.Cheng;F.D.Lai;H.M.Huang;Lon, A.Wang
臺大學術典藏 2003-06 Ultra-thin Cr2O3 Well-crystallized films for high transmittance APSM in ArF line F. D. Lai,; C. Y. Huang,; C. M. Chang,; L. A. Wang,; W. C. Cheng,; LON A. WANG
國立高雄第一科技大學 2002.04 Fabrication and characterization of aluminium oxide/chromium oxide optical superlattice for APSM at 193nm wavelength F.D.Lai;L.A.Wang
國立高雄第一科技大學 2001.09 Optical Properties of CrO/ZrO Optical Superlattice for Attenuated Phase Shifting Mask at 193nm Wavelength F.D.Lai;L.A.Wang

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