臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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Institution	Date	Title	Author
國立交通大學	2014-12-08T15:25:40Z	The impact of uniaxial strain engineering on channel backscattering in nanoscale MOSFETs	Lin, HN; Chen, HW; Ko, CH; Ge, CH; Lin, HC; Huang, TY; Lee, WC; Tang, DD
國立交通大學	2014-12-08T15:25:11Z	Channel backscattering characteristics of strained PMOSFETs with embedded SiGe source/drain	Lin, HN; Chen, HW; Ko, CH; Ge, CH; Lin, HC; Huang, TY; Lee, WC
國立交通大學	2014-12-08T15:18:31Z	Channel backscattering characteristics of uniaxially strained nanoscale CMOSFETs	Lin, HN; Chen, HW; Ko, CH; Ge, CH; Lin, HC; Huang, TY; Lee, WC

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