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Institution	Date	Title	Author
臺大學術典藏	2022-01-03T08:01:25Z	Refractive index, absorbance and thickness measurement of underlayer materials for the EUV lithography at 13.5-nm	Fu-Hsiu Kang; Grace.H. Ho*; Hok-Sum Fung; Huang-Wen Fu; Chia-Chun Hung; Jia-Han Li; JIA-HAN LI

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