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Showing items 1-3 of 3 (1 Page(s) Totally) 1 View [10|25|50] records per page
臺大學術典藏 |
2020-01-06T03:08:41Z |
Measurement and modeling of time- and spatial-resolved wafer surface temperature in inductively coupled plasmas
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Hsu, C. C.; Titus, M. J.; Graves, D. B.; JERRY CHENG-CHE HSU |
臺大學術典藏 |
2020-01-06T03:08:39Z |
Comparison of model and experiment for Ar, Ar/O2 and Ar/O 2/Cl2 inductively coupled plasmas
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Hsu, C.-C.; Nierode, M.A.; Coburn, J.W.; Graves, D.B.; JERRY CHENG-CHE HSU |
臺大學術典藏 |
2020-01-06T03:08:39Z |
Etching of ruthenium coatings in O 2- and Cl 2- containing plasmas
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Hsu, C.C.; Coburn, J.W.; Graves, D.B.; JERRY CHENG-CHE HSU |
Showing items 1-3 of 3 (1 Page(s) Totally) 1 View [10|25|50] records per page
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