臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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	Repositories
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	2019臺灣學術機構典藏研討會
	機構典藏系統RC7版本已發佈

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	機構典藏計畫網站
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	臺大學術典藏NTU Scholars

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Institution	Date	Title	Author
臺大學術典藏	2020-10-07T01:24:56Z	A Thermoresponsive Bubble-Generating Liposomal System for Triggering Localized Extracellular Drug Delivery	H.L. Chen; H.F. Liang; K.J. Chen; K.J. Chen;H.F. Liang;H.L. Chen;Y.C. Wang;P.Y. Cheng;Y.N. Xia;H.W. Sung;HAO-LI LIU; HAO-LI LIU; 劉浩澧; H.W. Sung; Y.N. Xia; H.L. Liu; P.Y. Cheng; Y.C. Wang; Y.C. Wang; P.Y. Cheng; H.L. Liu; Y.N. Xia; H.W. Sung; HAO-LI LIU; K.J. Chen; H.F. Liang; H.L. Chen
臺大學術典藏	2018-09-10T07:42:40Z	A Novel Bottom Antireflective Coating Working for Both KrF and ArF Lithography	L. A. Wang; H. L. Chen; LON A. WANG
臺大學術典藏	2018-09-10T07:42:40Z	Simulation on a New Reflection Type Attenuated Phase Shifting Mask for Extreme Ultraviolet Lithography	H. L. Chen; L. A. Wang; LON A. WANG
臺大學術典藏	2018-09-10T07:42:40Z	Silicon-Oxynitride Films Prepared for 157 nm Attenuated Phase Shifting Masks	H. L. Chen; F. D. Lai; L. A. Wang; LON A. WANG
臺大學術典藏	2018-09-10T07:42:39Z	Multilayer Hexamethyldisiloxane Film as bottom antireflective coating for ArF lithography	L. A. Wang; H. L. Chen; LON A. WANG
臺大學術典藏	2018-09-10T07:42:38Z	Hexamethyldisiloxane Film as the Bottom Antireflective Coating Layer for ArF Excimer Laser Lithography	H. L. Chen; L. A. Wang; LON A. WANG
臺大學術典藏	2018-09-10T07:09:07Z	Beyond the 130 nm-Generation by Employing DUV Lithography	LON A. WANG; C. H. Lin; H. L. Chen; L. A. Wang
臺大學術典藏	2018-09-10T07:09:07Z	Fabrication of Sub-Quarter-Micron Grating Patterns by Employing DUV Holographic Lithography	L. A. Wang; C. H. Lin; H. L. Chen; LON A. WANG
臺大學術典藏	2018-09-10T07:09:07Z	Fabrication of Phase Shifting Mask Patterns by Utilizing Top Surface Imaging Technique	L. A. Wang,; H. L. Chen,; C. H. Lin,; LON A. WANG
臺大學術典藏	2018-09-10T07:09:07Z	Optical Characteristics and Irradiation Stability of PECVD-Grown Sinx Films Prepared for DUV Attenuated Phase Shifting Masks	L. A. Wang,; H. L. Chen,; C. W. Hsu,; L. S. Yeh,; LON A. WANG

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