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Institution Date Title Author
中國文化大學 2011-02 Bias voltage effect on the structure and property of the (Ti:Cu)-DLC films fabricated by cathodic arc plasma o, JY (Jao, Jui-Yun); Han, S (Han, Sheng); Yen, CC (Yen, Chung-Chih); Liu, YC (Liu, Yu-Ching); Chang, LS (Chang, Li-Shin); Chang, CL (Chang, Chi-Lung); Shih, HC (Shih, Han-C.)
中國文化大學 2010-10 Bias voltage effect on the structure and property of chromium copper-diamond-like carbon multilayer films fabricated by cathodic arc plasma Jao, JY (Jao, Jui-Yun); Han, S (Han, Sheng); Chang, LS (Chang, Li-Shin); Chang, CL (Chang, Chi-Lung); Liu, YC (Liu, Yu-Ching); Shih, HC (Shih, Han C.)
中國文化大學 2009-02 Formation and characterization of DLC:Cr:Cu multi-layers coating using cathodic arc evaporation Jao, JY (Jao, Jui Yun); Han, S (Han, Sheng); Chang, LS (Chang, Li Shen); Chen, YC (Chen, Ya-Chi); Chang, CL (Chang, Chi-Lung); Shih, HC (Shih, Han Chang)

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