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Institution Date Title Author
國立交通大學 2014-12-08T15:07:39Z Evaluation of the nanoindentation behaviors of SiGe epitaxial layer on Si substrate He, Bo-Ching; Cheng, Chun-Hu; Wen, Hua-Chiang; Lai, Yi-Shao; Yang, Ping-Feng; Lin, Meng-Hung; Wu, Wen-Fa; Chou, Chang-Pin
國立交通大學 2014-12-08T15:07:20Z Effect of strain relaxation of oxidation-treated SiGe epitaxial thin films and its nanomechanical characteristics He, Bo-Ching; Wen, Hua-Chiang; Chinag, Tun-Yuan; Chang, Zue-Chin; Lian, Derming; Yau, Wei-Hung; Wu, Wen-Fa; Chou, Chang-Pin
國立交通大學 2014-12-08T15:06:46Z Effect of annealing treatment and nanomechanical properties for multilayer Si(0.8)Ge(0.2)-Si films He, Bo-Ching; Wen, Hua-Chiang; Lin, Meng-Hung; Lai, Yi-Shao; Wu, Wen-Fa; Chou, Chang-Pin

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