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| 國立交通大學 |
2014-12-08T15:07:39Z |
Evaluation of the nanoindentation behaviors of SiGe epitaxial layer on Si substrate
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He, Bo-Ching; Cheng, Chun-Hu; Wen, Hua-Chiang; Lai, Yi-Shao; Yang, Ping-Feng; Lin, Meng-Hung; Wu, Wen-Fa; Chou, Chang-Pin |
| 國立交通大學 |
2014-12-08T15:07:20Z |
Effect of strain relaxation of oxidation-treated SiGe epitaxial thin films and its nanomechanical characteristics
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He, Bo-Ching; Wen, Hua-Chiang; Chinag, Tun-Yuan; Chang, Zue-Chin; Lian, Derming; Yau, Wei-Hung; Wu, Wen-Fa; Chou, Chang-Pin |
| 國立交通大學 |
2014-12-08T15:06:46Z |
Effect of annealing treatment and nanomechanical properties for multilayer Si(0.8)Ge(0.2)-Si films
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He, Bo-Ching; Wen, Hua-Chiang; Lin, Meng-Hung; Lai, Yi-Shao; Wu, Wen-Fa; Chou, Chang-Pin |
Showing items 1-3 of 3 (1 Page(s) Totally)
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