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Institution	Date	Title	Author
臺大學術典藏	2022-01-03T08:01:20Z	Simulation and fabrication results of electron optical systems for massively parallel maskless lithography	Hoi-Tou Ng; Chien-Chieh Huang; Hsing-Hong Chen; Shin-Chuan Chen; Ken-Hsien Hsieh; Kuen-Yu Tsai*; Jia-Han Li; JIA-HAN LI
臺大學術典藏	2018-09-10T15:00:24Z	Method and Apparatus For Designing Patterning Systems Considering Patterning Fidelity (基於圖案製作真確度之圖案製作系統設計方法與裝置)	Kuen-Yu Tsai;Sheng-Yung Chen;Hoi-Tou Ng;Shiau-Yi Ma; Kuen-Yu Tsai; Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; KUEN-YU TSAI
臺大學術典藏	2018-09-10T15:00:24Z	Method and Apparatus For Designing Patterning Systems Considering Patterning Fidelity (基於圖案製作真確度之圖案製作系統設計方法與裝置)	Kuen-Yu Tsai;Sheng-Yung Chen;Hoi-Tou Ng;Shiau-Yi Ma; Kuen-Yu Tsai; Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; KUEN-YU TSAI
臺大學術典藏	2018-09-10T09:50:34Z	Method and Apparatus for Designing Patterning System Based on Patterning Fidelity	Kuen-Yu Tsai;Sheng-Yung Chen;Hoi-Tou Ng;Shiau-Yi Ma; Kuen-Yu Tsai; Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; KUEN-YU TSAI
臺大學術典藏	2018-09-10T09:50:34Z	Method and Apparatus for Designing Patterning System Based on Patterning Fidelity	Kuen-Yu Tsai;Sheng-Yung Chen;Hoi-Tou Ng;Shiau-Yi Ma; Kuen-Yu Tsai; Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; KUEN-YU TSAI
臺大學術典藏	2018-09-10T09:25:00Z	New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints	Hoi-Tou Ng;Yu-Tian Shen;Sheng-Yung Chen;Chun-Hung Liu;Philip C. W. Ng;Kuen-Yu Tsai; Hoi-Tou Ng; Yu-Tian Shen; Sheng-Yung Chen; Chun-Hung Liu; Philip C. W. Ng; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T09:25:00Z	New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints	Hoi-Tou Ng;Yu-Tian Shen;Sheng-Yung Chen;Chun-Hung Liu;Philip C. W. Ng;Kuen-Yu Tsai; Hoi-Tou Ng; Yu-Tian Shen; Sheng-Yung Chen; Chun-Hung Liu; Philip C. W. Ng; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T09:24:59Z	New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithography	Chun-Hung Liu;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T09:24:59Z	New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithography	Chun-Hung Liu;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:33Z	Lithography-patterning-fidelity-aware electron-optical system design optimization	Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Chun-Hung Liu; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:33Z	Lithography-patterning-fidelity-aware electron-optical system design optimization	Sheng-Yung Chen; Hoi-Tou Ng; Shiau-Yi Ma; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:22Z	Beam drift detection using a two-dimensional electron beam position monitor system for multiple-electron-beam–direct-write lithography	Sheng-Yung Chen;Kuen-Yu Tsai;Hoi-Tou Ng;Chi-Hsiung Fan;Ting-Han Pei;Chieh-Hsiung Kuan;Yung-Yaw Chen;Yi-Hung Kuo;Cheng-Ju Wu;Jia-Yush Yen; Sheng-Yung Chen; Kuen-Yu Tsai; Hoi-Tou Ng; Chi-Hsiung Fan; Ting-Han Pei; Chieh-Hsiung Kuan; Yung-Yaw Chen; Yi-Hung Kuo; Cheng-Ju Wu; Jia-Yush Yen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:22Z	Beam drift detection using a two-dimensional electron beam position monitor system for multiple-electron-beam–direct-write lithography	Sheng-Yung Chen;Kuen-Yu Tsai;Hoi-Tou Ng;Chi-Hsiung Fan;Ting-Han Pei;Chieh-Hsiung Kuan;Yung-Yaw Chen;Yi-Hung Kuo;Cheng-Ju Wu;Jia-Yush Yen; Sheng-Yung Chen; Kuen-Yu Tsai; Hoi-Tou Ng; Chi-Hsiung Fan; Ting-Han Pei; Chieh-Hsiung Kuan; Yung-Yaw Chen; Yi-Hung Kuo; Cheng-Ju Wu; Jia-Yush Yen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:22Z	Impacts of point spread function calibration methods on model-based proximity effect correction for electron-beam-direct-write lithography	Chun-Hung Liu;Philip Ng;Yu-Tian Shen;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Philip Ng; Yu-Tian Shen; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:22Z	Impacts of point spread function calibration methods on model-based proximity effect correction for electron-beam-direct-write lithography	Chun-Hung Liu;Philip Ng;Yu-Tian Shen;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Philip Ng; Yu-Tian Shen; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T07:42:07Z	Determination of Gaussian beam and raster scan parameters in electron-beam-direct-write lithography considering device patterning and performance variability	Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng; Chun-Hung Liu; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T07:42:07Z	Determination of Gaussian beam and raster scan parameters in electron-beam-direct-write lithography considering device patterning and performance variability	Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng; Chun-Hung Liu; Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T07:42:06Z	A new parametric proximity effect model calibration method for improving accuracy of post-lithography patterning prediction in sub-32-nm half-pitch low-voltage electron beam direct-write lithography	Chun-Hung Liu;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T07:42:06Z	A new parametric proximity effect model calibration method for improving accuracy of post-lithography patterning prediction in sub-32-nm half-pitch low-voltage electron beam direct-write lithography	Chun-Hung Liu;Hoi-Tou Ng;Kuen-Yu Tsai; Chun-Hung Liu; Hoi-Tou Ng; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T07:42:05Z	Selection of Gaussian-beam and raster-scan parameters in electron-beam direct-write lithography considering device patterning and performance variability	Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu; Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng
臺大學術典藏	2018-09-10T07:42:05Z	Selection of Gaussian-beam and raster-scan parameters in electron-beam direct-write lithography considering device patterning and performance variability	Hsing-Hong Chen; Kuen-Yu Tsai; KUEN-YU TSAI; Chun-Hung Liu; Hoi-Tou Ng;Chun-Hung Liu;Hsing-Hong Chen;Kuen-Yu Tsai; Hoi-Tou Ng
臺大學術典藏	2018-09-10T07:08:40Z	A novel curve-fitting procedure for determining proximity effect parameters in electron beam lithography	Chun-Hung Liu;Hoi-Tou Ng;Philip C. W. Ng;Kuen-Yu Tsai;Shy-Jay Lin;Jeng-Horng Chen; Chun-Hung Liu; Hoi-Tou Ng; Philip C. W. Ng; Kuen-Yu Tsai; Shy-Jay Lin; Jeng-Horng Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T07:08:40Z	A novel curve-fitting procedure for determining proximity effect parameters in electron beam lithography	Chun-Hung Liu;Hoi-Tou Ng;Philip C. W. Ng;Kuen-Yu Tsai;Shy-Jay Lin;Jeng-Horng Chen; Chun-Hung Liu; Hoi-Tou Ng; Philip C. W. Ng; Kuen-Yu Tsai; Shy-Jay Lin; Jeng-Horng Chen; KUEN-YU TSAI
臺大學術典藏	2012-02	Electron-beam proximity effect model calibration for fabricating scatterometry calibration samples	Chun-Hung Liu; Chih-Yu Chen; Hoi-Tou Ng; Kuen-Yu Tsai; Fu-Ming Wang; Chieh-Hsiung Kuan; Yen-Min Lee; Hsin-Hung Cheng; Jia-Han Li; Alek C. Chen; Yu-Tian Shen; KUEN-YU TSAI; CHIEH-HSIUNG KUAN et al.

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