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臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)
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Institution Date Title Author
國立臺灣大學 2003 Thermal Stress at Wafer Contact Points in Rapid Thermal Processing Investigated by Repeated Spike Treatment before Oxidation Hong, Chao-Chi; Chang, Chang-Yun; Lee, Chaung-Yuan; Hwu, Jenn-Gwo
國立臺灣大學 2003 Thickness-Dependent Stress Effect in P-type Metal-Oxide-Semiconductor Structure Investigated by Substrate Injection Current Hong, Chao-Chi; Liao, Wei-Jian; Hwu, Jenn-Gwo
國立臺灣大學 2003 Stress Distribution on (100) Si Wafer Mapped by Novel I-V Analysis of MOS Tunneling Diodes Hong, Chao-Chi; Hwu, Jenn-Gwo
國立臺灣大學 2002-01 Reduction in Leakage Current of Low-Temperature Thin-Gate Oxide by Repeated Spike Oxidation Technique Hong, Chao-Chi; Chang, Chang-Yun; Lee, Chaung-Yuan; Hwu, Jenn-Gwo
臺大學術典藏 2002-01 Reduction in Leakage Current of Low-Temperature Thin-Gate Oxide by Repeated Spike Oxidation Technique Hong, Chao-Chi; Chang, Chang-Yun; Lee, Chaung-Yuan; Hwu, Jenn-Gwo; Hong, Chao-Chi; Chang, Chang-Yun; Lee, Chaung-Yuan; Hwu, Jenn-Gwo
國立臺灣大學 2002 Local Thinning-Induced Oxide Nonuniformity Effect on the Tunneling Current of Ultrathin Gate Oxide Hong, Chao-Chi; Chen, Wei-Ren; Hwu, Jenn-Gwo
國立臺灣大學 2002 Improvement in Ultrathin Rapid Thermal Oxide Uniformity by the Control of Gas Flow Hong, Chao-Chi; Yen, Yuh-Ren; Su, Jiann-Liang; Hwu, Jenn-Gwo
國立臺灣大學 2002 Improvement of oxide thickness uniformity by high then low O2 pressure oxidation in rapid thermal processing Hong, Chao-Chi; Chen, Jenn-Long; Hwu, Jenn-Gwo
國立臺灣大學 2002 Enhanced thermally induced stress effect on an ultrathin gate oxide Su, Jiann-Liang; Hong, Chao-Chi; Hwu, Jenn-Gwo
國立臺灣大學 2002 Silicon Metal-Oxide-Semiconductor Solar Cells with Oxide Prepared by Room Temperature Anodization in Hydrofluosilicic Acid Solution Chen, Chih-Hao; Hong, Chao-Chi; Hwu, Jenn-Gwo
國立臺灣大學 2001 Improvement in oxide thickness uniformity by repeated spikeoxidation Hong, Chao-Chi; Lee, Chuang-Yuan; Hsieh, Yuan-Long; Liu, Chean-Chung; Fong, I.-K.; Hwu, Jenn-Gwo
國立臺灣大學 2001 Degradation in Metal-Oxide-Semiconductor Structure with Ultrathin Gate Oxide due to External Compressive Stress Hong, Chao-Chi; Hwu, Jenn-Gwo

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