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Showing items 1-3 of 3 (1 Page(s) Totally)
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| 臺大學術典藏 |
2018-09-10T08:40:09Z |
利用高介電材料與三五族高電子遷移率通道材料之介面調變工程作為鈍化保護以實現超越矽互補式金氧半場效電晶體技術之研究
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Huang, Tsung-Shiew; Hong, Mingwhei; Chang, Pen; Kwo, Jueinai; 張翔筆; Huang, Tsung-Shiew; Hong, Mingwhei; Chang, Pen; Kwo, Jueinai; 張翔筆; MINGHWEI HONG |
| 臺大學術典藏 |
2018-09-10T08:40:09Z |
利用高介電材料與三五族高電子遷移率通道材料之介面調變工程作為鈍化保護以實現超越矽互補式金氧半場效電晶體技術之研究
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Huang, Tsung-Shiew; Hong, Mingwhei; Chang, Pen; Kwo, Jueinai; 張翔筆; Huang, Tsung-Shiew; Hong, Mingwhei; Chang, Pen; Kwo, Jueinai; 張翔筆; MINGHWEI HONG |
| 臺大學術典藏 |
2018-09-10T06:28:14Z |
Self-aligned inversion n-channel In 0.2 Ga 0.8 As/GaAs MOSFET with TiN gate and Ga 2 O 3 (Gd 2 O 3) dielectric
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Chen, Chih-Ping; Lin, Tsung-Da; Chang, Yao-Chung; Hong, Mingwhei; Kwo, J Raynien; MINGHWEI HONG |
Showing items 1-3 of 3 (1 Page(s) Totally)
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