臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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Institution	Date	Title	Author
臺大學術典藏	2021-08-05T02:41:01Z	Low-Temperature Physical Adsorption for the Nucleation of Sub-10 nm Al2O3Gate Stack on Top-Gated WS2Transistors	Lin Y.-S;Hoo J.-Y;Chung T.-F;Yang J.-R;Chen M.-J.; Lin Y.-S; Hoo J.-Y; Chung T.-F; Yang J.-R; Chen M.-J.; MIIN-JANG CHEN
臺大學術典藏	2021-08-05T02:41:01Z	Low-Temperature Physical Adsorption for the Nucleation of Sub-10 nm Al2O3Gate Stack on Top-Gated WS2Transistors	Lin Y.-S;Hoo J.-Y;Chung T.-F;Yang J.-R;Chen M.-J.; Lin Y.-S; Hoo J.-Y; Chung T.-F; Yang J.-R; Chen M.-J.; MIIN-JANG CHEN
臺大學術典藏	2021-08-05T02:40:59Z	Low-Temperature Physical Adsorption for the Nucleation of Sub-10 nm Al2O3Gate Stack on Top-Gated WS2Transistors	Lin Y.-S;Hoo J.-Y;Chung T.-F;Yang J.-R;Chen M.-J.; Lin Y.-S; Hoo J.-Y; Chung T.-F; Yang J.-R; Chen M.-J.; JER-REN YANG
臺大學術典藏	2021-08-05T02:40:59Z	Low-Temperature Physical Adsorption for the Nucleation of Sub-10 nm Al2O3Gate Stack on Top-Gated WS2Transistors	Lin Y.-S;Hoo J.-Y;Chung T.-F;Yang J.-R;Chen M.-J.; Lin Y.-S; Hoo J.-Y; Chung T.-F; Yang J.-R; Chen M.-J.; JER-REN YANG

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