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Institution Date Title Author
國立交通大學 2014-12-08T15:46:06Z Improvement of junction leakage of nickel silicided junction by a Ti-capping layer Hou, TH; Lei, TF; Chao, TS
國立交通大學 2014-12-08T15:25:43Z Effects of base oxide in HfSiO/SiO2 high-k gate stacks Wu, WH; Chen, MC; Wang, MF; Hou, TH; Yao, LG; Jin, Y; Chen, SC; Liang, MS

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