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Showing items 11-17 of 17  (1 Page(s) Totally)
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Institution Date Title Author
國立交通大學 2014-12-08T15:37:37Z Constant voltage stress induced charge trapping and detrapping characteristics of the Si(3)N(4) uniaxial strained n-channel metal-oxide-semiconductor field-effect-transistor with fluorinated HfO(2)/SiON gate stack Chen, Yung-Yu; Hsieh, Chih-Ren; Chiu, Fang-Yu
國立交通大學 2014-12-08T15:23:37Z Stress immunity enhancement of the SiN uniaxial strained n-channel metal-oxide-semiconductor field-effect-transistor by channel fluorine implantation Chen, Yung-Yu; Hsieh, Chih-Ren; Chiu, Fang-Yu
國立交通大學 2014-12-08T15:21:42Z Enhanced data retention characteristic on SOHOS-type nonvolatile flash memory with CF4-plasma-induced deep electron trap level Hsieh, Chih-Ren; Chen, Yung-Yu; Lin, Wen-Shin; Lin, Gray; Lou, Jen-Chung
國立交通大學 2014-12-08T15:17:54Z Reliability Improvement of HfO(2)/SiON Gate Stacked nMOSFET using Fluorinated Silicate Glass Passivation Layer Hsieh, Chih-Ren; Chen, Yung-Yu; Chung, Jer-Fu; Lou, Jen-Chung
國立交通大學 2014-12-08T15:11:58Z Improved Retention Characteristic in Polycrystalline Silicon-Oxide-Hafnium Oxide-Oxide-Silicon-Type Nonvolatile Memory with Robust Tunnel Oxynitride Hsieh, Chih Ren; Lai, Chiung Hui; Lin, Bo Chun; Zheng, Yuan Kai; Lou, Jen Chung; Lin, Gray
國立交通大學 2014-12-08T15:11:31Z Effect of interfacial fluorination on the electrical properties of the inter-poly high-k dielectrics Hsieh, Chih-Ren; Chen, Yung-Yu; Lu, Kwung-Wen; Lin, Gray; Lou, Jen-Chung
國立交通大學 2014-12-08T15:07:35Z Improved performance and reliability for metal-oxide-semiconductor field-effect-transistor with fluorinated silicate glass passivation layer Hsieh, Chih-Ren; Chen, Yung-Yu; Lou, Jen-Chung

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