|
|
Taiwan Academic Institutional Repository >
Browse by Author
|
"hsieh i j"
Showing items 1-5 of 5 (1 Page(s) Totally)
1
View [10|25|50] records per page
| 國立交通大學 |
2014-12-08T15:15:04Z |
Very high density (44 fF/mu m(2)) SrTiO3 MIM capacitors for RF applications
|
Chiang, K. C.; Lin, J. W.; Pan, H. C.; Hsiao, C. N.; Chen, W. J.; Kao, H. L.; Hsieh, I. J.; Chin, Albert |
| 國立交通大學 |
2014-12-08T15:15:03Z |
Thermal leakage improvement by using a high-work-function ni electrode in high-kappa TiHfO metal-insulator-metal capacitors
|
Chiang, K. C.; Huang, C. C.; Pan, H. C.; Hsiao, C. N.; Lin, J. W.; Hsieh, I. J.; Cheng, C. H.; Chou, C. P.; Chin, A.; Hwang, H. L.; McAlister, S. P. |
| 國立交通大學 |
2014-12-08T15:13:18Z |
A program-erasable high-k Hf0.3N0.2O0.5 MIS capacitor with good retention
|
Yang, H. J.; Chin, Albert; Chen, W. J.; Cheng, C. F.; Huang, W. L.; Hsieh, I. J.; McAlister, S. P. |
| 國立交通大學 |
2014-12-08T15:11:24Z |
Low threshold voltage and high drive current poly-silicon thin film transistors using Ytterbium metal gate and LaAlO3 dielectric
|
Hung, B. F.; Wu, C. H.; Chin, Albert; Wang, S. J.; Lin, J. W.; Hsieh, I. J. |
| 國立交通大學 |
2014-12-08T15:07:53Z |
High-kappa TiCeO MIM Capacitors with a Dual-Plasma Interface Treatment
|
Cheng, C. H.; Hsu, H. H.; Hsieh, I. J.; Deng, C. K.; Chin, Albert; Yeh, F. S. |
Showing items 1-5 of 5 (1 Page(s) Totally)
1
View [10|25|50] records per page
|
