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Showing items 1-5 of 5 (1 Page(s) Totally) 1 View [10|25|50] records per page
國立交通大學 |
2014-12-08T15:15:04Z |
Very high density (44 fF/mu m(2)) SrTiO3 MIM capacitors for RF applications
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Chiang, K. C.; Lin, J. W.; Pan, H. C.; Hsiao, C. N.; Chen, W. J.; Kao, H. L.; Hsieh, I. J.; Chin, Albert |
國立交通大學 |
2014-12-08T15:15:03Z |
Thermal leakage improvement by using a high-work-function ni electrode in high-kappa TiHfO metal-insulator-metal capacitors
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Chiang, K. C.; Huang, C. C.; Pan, H. C.; Hsiao, C. N.; Lin, J. W.; Hsieh, I. J.; Cheng, C. H.; Chou, C. P.; Chin, A.; Hwang, H. L.; McAlister, S. P. |
國立交通大學 |
2014-12-08T15:13:18Z |
A program-erasable high-k Hf0.3N0.2O0.5 MIS capacitor with good retention
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Yang, H. J.; Chin, Albert; Chen, W. J.; Cheng, C. F.; Huang, W. L.; Hsieh, I. J.; McAlister, S. P. |
國立交通大學 |
2014-12-08T15:11:24Z |
Low threshold voltage and high drive current poly-silicon thin film transistors using Ytterbium metal gate and LaAlO3 dielectric
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Hung, B. F.; Wu, C. H.; Chin, Albert; Wang, S. J.; Lin, J. W.; Hsieh, I. J. |
國立交通大學 |
2014-12-08T15:07:53Z |
High-kappa TiCeO MIM Capacitors with a Dual-Plasma Interface Treatment
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Cheng, C. H.; Hsu, H. H.; Hsieh, I. J.; Deng, C. K.; Chin, Albert; Yeh, F. S. |
Showing items 1-5 of 5 (1 Page(s) Totally) 1 View [10|25|50] records per page
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