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Showing items 1-25 of 28  (2 Page(s) Totally)
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Institution Date Title Author
國立交通大學 2019-04-02T06:00:15Z Formation of iridium nanocrystals with highly thermal stability for the applications of nonvolatile memory device with excellent trapping ability Wang, Terry Tai-Jui; Chu, Chang-Lung; Hsieh, Ing-Jar; Tseng, Wen-Shou
國立交通大學 2019-04-02T05:59:00Z Ir Nanocrystals on Asymmetric Si3N4/SiO2 Tunneling Layer with Large Memory Window for Nonvolatile Memory Application Wang, Terry Tai-Jui; Chen, Chao-Jui; Teng, I-Ju; Hsieh, Ing-Jar; Kuo, Cheng-Tzu
國立交通大學 2019-04-02T05:58:46Z Iridium Nanocrystal Thin-Film Transistor Nonvolatile Memory with Si3N4/SiO2 Stack of Asymmetric Tunnel Barrier Wang, Terry Tai-Jui; Lu, Tien-Lin; Wu, Chien-Hung; Liu, Yu-Cheng; Hung, Shih-Wei; Hsieh, Ing-Jar; Kuo, Cheng-Tzu
國立交通大學 2014-12-08T15:48:06Z Formation of iridium nanocrystals with highly thermal stability for the applications of nonvolatile memory device with excellent trapping ability Wang, Terry Tai-Jui; Chu, Chang-Lung; Hsieh, Ing-Jar; Tseng, Wen-Shou
國立交通大學 2014-12-08T15:33:03Z Nickel Nanocrystals Embedded in Metal-Alumina-Nitride-Oxide-Silicon Type Low-Temperature Polycrystalline-Silicon Thin-Film Transistor for Low-Voltage Nonvolatile Memory Application Wang, Terry Tai-Jui; Liu, Yu-Cheng; Wu, Chien-Hung; Lu, Tien-Lin; Hsieh, Ing-Jar; Kuo, Cheng-Tzu
國立交通大學 2014-12-08T15:28:09Z Formation of inverted-pyramid structure by modifying laser processing parameters and acid etching time Lin, Je-Wei; Liu, En-Ting; Wu, Chien-Hung; Hsieh, Ing-Jar; Chao, Tien-Sheng
國立交通大學 2014-12-08T15:11:45Z Ir Nanocrystals on Asymmetric Si(3)N(4)/SiO(2) Tunneling Layer with Large Memory Window for Nonvolatile Memory Application Wang, Terry Tai-Jui; Chen, Chao-Jui; Teng, I-Ju; Hsieh, Ing-Jar; Kuo, Cheng-Tzu
國立交通大學 2014-12-08T15:11:37Z Iridium Nanocrystal Thin-Film Transistor Nonvolatile Memory with Si(3)N(4)/SiO(2) Stack of Asymmetric Tunnel Barrier Wang, Terry Tai-Jui; Lu, Tien-Lin; Wu, Chien-Hung; Liu, Yu-Cheng; Hung, Shih-Wei; Hsieh, Ing-Jar; Kuo, Cheng-Tzu
中華大學 2014 Sputtering-deposited AlN film as the gate dielectric for n-MOSFETs Applications 謝英家; Hsieh, Ing-Jar
中華大學 2013 A Study of Au-Si Eutectic Bonding with Embedded Barrier Layers 謝英家; Hsieh, Ing-Jar
中華大學 2013 Cell Membrane of Biologic Cells for Gate Dielectric Application 謝英家; Hsieh, Ing-Jar
中華大學 2012 Reduction of wide-band crosstalk for guiding microwave in corrugated metal strip lines with subwavelength periodic hairpin slits 謝英家; Hsieh, Ing-Jar
中華大學 2012 Bandpass filter based on low frequency spoof surface plasmon polaritons 謝英家; Hsieh, Ing-Jar
中華大學 2011 Formation of inverted-pyramid structure by modifying laser processing parameters and acid etching time 謝英家; Hsieh, Ing-Jar
中華大學 2011 Novel Characteristics for Reducing Crosstalk in Corrugated Metal Strip Lines with Subwavelength Periodic Hairpin Slits 謝英家; Hsieh, Ing-Jar
中華大學 2011 Nickel Nanocrystals Embedded in Metal–Alumina–Nitride–Oxide–Silicon Type Low-Temperature Polycrystalline-Silicon Thin-Film Transistor for Low-Voltage Nonvolatile Memory Application 謝英家; Hsieh, Ing-Jar
中華大學 2011 Low-Frequency Surface Plasmon Polaritons Guided on a Corrugated Metal Striplines with Subwavelength Periodical Inward Slits 謝英家; Hsieh, Ing-Jar
中華大學 2011 Iridium Nanocrystal Thin-Film Transistor Nonvolatile Memory with Si3N4/SiO2 Stack of Asymmetric Tunnel Barrier 謝英家; Hsieh, Ing-Jar
中華大學 2010 Crosstalk Reduction Between Metal-Strips with Subwavelength Periodically Corrugated Structure 謝英家; Hsieh, Ing-Jar
中華大學 2010 Formation of Iridium Nanocrystals with Highly Thermal Stability for the Applications of Nonvolatile Memory Device with Excellent Trapping Ability 謝英家; Hsieh, Ing-Jar
中華大學 2010 High-k TiCeO MIM Capacitors with a Dual-Plasma Interface Treatment 謝英家; Hsieh, Ing-Jar
中華大學 2009 Growth of Low Voltage Phosphors Prepared by R.F. Magnetron Sputter Deposition 謝英家; Hsieh, Ing-Jar
中華大學 2008 Growth of Epitaxial Alloy Semiconductor with Higher Mobility 謝英家; Hsieh, Ing-Jar
中華大學 2007 Very High Density (44 fF/um2) SrTiO3 MIM Capacitors for RF Applications 謝英家; Hsieh, Ing-Jar
中華大學 2007 A Program-Erasable High-k Hfo.3No.2Oo.5 MIS Capacitor With Good Retention 謝英家; Hsieh, Ing-Jar

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