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Showing items 11-28 of 28 (2 Page(s) Totally) 1 2 > >> View [10|25|50] records per page
中華大學 |
2013 |
Cell Membrane of Biologic Cells for Gate Dielectric Application
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謝英家; Hsieh, Ing-Jar |
中華大學 |
2012 |
Reduction of wide-band crosstalk for guiding microwave in corrugated metal strip lines with subwavelength periodic hairpin slits
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謝英家; Hsieh, Ing-Jar |
中華大學 |
2012 |
Bandpass filter based on low frequency spoof surface plasmon polaritons
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謝英家; Hsieh, Ing-Jar |
中華大學 |
2011 |
Formation of inverted-pyramid structure by modifying laser processing parameters and acid etching time
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謝英家; Hsieh, Ing-Jar |
中華大學 |
2011 |
Novel Characteristics for Reducing Crosstalk in Corrugated Metal Strip Lines with Subwavelength Periodic Hairpin Slits
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謝英家; Hsieh, Ing-Jar |
中華大學 |
2011 |
Nickel Nanocrystals Embedded in Metal–Alumina–Nitride–Oxide–Silicon Type Low-Temperature Polycrystalline-Silicon Thin-Film Transistor for Low-Voltage Nonvolatile Memory Application
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謝英家; Hsieh, Ing-Jar |
中華大學 |
2011 |
Low-Frequency Surface Plasmon Polaritons Guided on a Corrugated Metal Striplines with Subwavelength Periodical Inward Slits
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謝英家; Hsieh, Ing-Jar |
中華大學 |
2011 |
Iridium Nanocrystal Thin-Film Transistor Nonvolatile Memory with Si3N4/SiO2 Stack of Asymmetric Tunnel Barrier
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謝英家; Hsieh, Ing-Jar |
中華大學 |
2010 |
Crosstalk Reduction Between Metal-Strips with Subwavelength Periodically Corrugated Structure
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謝英家; Hsieh, Ing-Jar |
中華大學 |
2010 |
Formation of Iridium Nanocrystals with Highly Thermal Stability for the Applications of Nonvolatile Memory Device with Excellent Trapping Ability
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謝英家; Hsieh, Ing-Jar |
中華大學 |
2010 |
High-k TiCeO MIM Capacitors with a Dual-Plasma Interface Treatment
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謝英家; Hsieh, Ing-Jar |
中華大學 |
2009 |
Growth of Low Voltage Phosphors Prepared by R.F. Magnetron Sputter Deposition
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謝英家; Hsieh, Ing-Jar |
中華大學 |
2008 |
Growth of Epitaxial Alloy Semiconductor with Higher Mobility
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謝英家; Hsieh, Ing-Jar |
中華大學 |
2007 |
Very High Density (44 fF/um2) SrTiO3 MIM Capacitors for RF Applications
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謝英家; Hsieh, Ing-Jar |
中華大學 |
2007 |
A Program-Erasable High-k Hfo.3No.2Oo.5 MIS Capacitor With Good Retention
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謝英家; Hsieh, Ing-Jar |
中華大學 |
2006 |
Atomically Smooth Interface between Ultra-Thin Oxide and Si Substrate
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謝英家; Hsieh, Ing-Jar |
中華大學 |
2005 |
場發射顯示器陣列之研製
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謝英家; Hsieh, Ing-Jar |
中華大學 |
2004 |
離子選擇場效應電晶體類比混合訊號處理晶片之設計在線性感測陣列之應用
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謝英家; Hsieh, Ing-Jar |
Showing items 11-28 of 28 (2 Page(s) Totally) 1 2 > >> View [10|25|50] records per page
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