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"hsien sk"
Showing items 1-6 of 6 (1 Page(s) Totally)
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| 國立交通大學 |
2019-04-02T06:00:01Z |
The role of resist for ultrathin gate oxide degradation during O-2 plasma ashing
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Chien, CH; Chang, CY; Lin, HC; Chiou, SG; Huang, TY; Chang, TF; Hsien, SK |
| 國立交通大學 |
2014-12-08T15:46:47Z |
Oxide thickness dependence of plasma charging damage
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Lin, HC; Chen, CC; Wang, MF; Hsien, SK; Chien, CH; Huang, TY; Chang, CY |
| 國立交通大學 |
2014-12-08T15:45:52Z |
Improved immunity to plasma damage in ultrathin nitrided oxides
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Chen, CC; Lin, HC; Chang, CY; Liang, MS; Chien, CH; Hsien, SK; Huang, TY |
| 國立交通大學 |
2014-12-08T15:45:05Z |
Plasma-induced charging damage in ultrathin (3-nm) gate oxides
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Chen, CC; Lin, HC; Chang, CY; Liang, MS; Chien, CH; Hsien, SK; Huang, TY; Chao, TS |
| 國立交通大學 |
2014-12-08T15:01:50Z |
The role of resist for ultrathin gate oxide degradation during O-2 plasma ashing
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Chien, CH; Chang, CY; Lin, HC; Chiou, SG; Huang, TY; Chang, TF; Hsien, SK |
| 國立交通大學 |
2014-12-08T15:01:41Z |
The role of a resist during O-2 plasma ashing and its impact on the reliability evaluation of ultrathin gate oxides
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Chien, CH; Chang, CY; Lin, HC; Chang, TF; Hsien, SK; Tseng, HC; Chiou, SG; Huang, TY |
Showing items 1-6 of 6 (1 Page(s) Totally)
1
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