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Showing items 101-125 of 176 (8 Page(s) Totally)
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Institution	Date	Title	Author
臺大學術典藏	2018-09-10T07:08:19Z	Gate-Level Dual-Threshold Total Power Optimization Methodology (GDTPOM) Principle for Designing High-Speed Low-Power SOC Applications	R. Chen; R. Liu; J. B. Kuo; JAMES-B KUO
臺大學術典藏	2018-09-10T07:08:19Z	Analysis of STI Mechanical-Stress Induced Effects on 40nm PD SOI NMOS Devices	J. B. Kuo; J. B. Kuo; JAMES-B KUO
臺大學術典藏	2018-09-10T07:08:19Z	Analysis of STI Mechanical-Stress Induced Effects on 40nm PD SOI NMOS Devices	J. B. Kuo; J. B. Kuo; JAMES-B KUO
臺大學術典藏	2018-09-10T07:08:19Z	Transient Behavior of 40nm PD SOI NMOS Device Considering STI-Induced Mechanical Stress Effects	J. S. Su;J. B. Kuo; J. S. Su; J. B. Kuo; JAMES-B KUO
臺大學術典藏	2018-09-10T07:08:19Z	Transient Behavior of 40nm PD SOI NMOS Device Considering STI-Induced Mechanical Stress Effects	J. S. Su;J. B. Kuo; J. S. Su; J. B. Kuo; JAMES-B KUO
臺大學術典藏	2018-09-10T07:08:19Z	STI Mechanical-Stress Induced Small-Geometry Effect on Hysteresis Phenomenon of 40nm PD SOI NMOS Device	H. J. Hung;J. I. Lu;J. B. Kuo;G. S. Lin;C. S. Yeh;C. T. Tsai;M. Ma; H. J. Hung; J. I. Lu; J. B. Kuo; G. S. Lin; C. S. Yeh; C. T. Tsai; M. Ma; JAMES-B KUO
臺大學術典藏	2018-09-10T07:08:19Z	STI Mechanical-Stress Induced Small-Geometry Effect on Hysteresis Phenomenon of 40nm PD SOI NMOS Device	H. J. Hung;J. I. Lu;J. B. Kuo;G. S. Lin;C. S. Yeh;C. T. Tsai;M. Ma; H. J. Hung; J. I. Lu; J. B. Kuo; G. S. Lin; C. S. Yeh; C. T. Tsai; M. Ma; JAMES-B KUO
臺大學術典藏	2018-09-10T07:08:19Z	Compact Modeling of Sub-90nm CMOS VLSI Devices Considering Fringing Electric Field Effects	J. B. Kuo; J. B. Kuo; JAMES-B KUO
臺大學術典藏	2018-09-10T07:08:19Z	Compact Modeling of Sub-90nm CMOS VLSI Devices Considering Fringing Electric Field Effects	J. B. Kuo; J. B. Kuo; JAMES-B KUO
臺大學術典藏	2018-09-10T07:08:19Z	CMOS VLSI Engineering: Silicon-on-Insulator (SOI)	J. B. Kuo; K. W. Su; JAMES-B KUO
臺大學術典藏	2018-09-10T07:08:18Z	Gate-Level Dual-Threshold Static Power Optimization Methodology (GDSPOM) Using Path-Based Static Timing Analysis (STA) Technique for SOC Application	JAMES-B KUO; B. Chung; J. B. Kuo
臺大學術典藏	2018-09-10T07:08:18Z	Breakdown Behavior of 40-nm PD-SOI NMOS Device Considering STI-Induced Mechanical Stress Effect	I. S. Lin;V. C. Su;J. B. Kuo;D. Chen;C. S. Yeh;C. T. Tsai;M. Ma; I. S. Lin; V. C. Su; J. B. Kuo; D. Chen; C. S. Yeh; C. T. Tsai; M. Ma; JAMES-B KUO
臺大學術典藏	2018-09-10T07:08:18Z	Breakdown Behavior of 40-nm PD-SOI NMOS Device Considering STI-Induced Mechanical Stress Effect	I. S. Lin;V. C. Su;J. B. Kuo;D. Chen;C. S. Yeh;C. T. Tsai;M. Ma; I. S. Lin; V. C. Su; J. B. Kuo; D. Chen; C. S. Yeh; C. T. Tsai; M. Ma; JAMES-B KUO
臺大學術典藏	2018-09-10T07:08:18Z	Shallow-trench-isolation (STI)-induced mechanical-stress-related kink-effect behaviors of 40-nm PD SOI NMOS device	I. S. Lin;V. C. Su;J. B. Kuo;R. Lee;G. S. Lin;D. Chen;C. S. Yeh;C. T. Tsai;M. Ma; I. S. Lin; V. C. Su; J. B. Kuo; R. Lee; G. S. Lin; D. Chen; C. S. Yeh; C. T. Tsai; M. Ma; JAMES-B KUO
臺大學術典藏	2018-09-10T07:08:18Z	Shallow-trench-isolation (STI)-induced mechanical-stress-related kink-effect behaviors of 40-nm PD SOI NMOS device	I. S. Lin;V. C. Su;J. B. Kuo;R. Lee;G. S. Lin;D. Chen;C. S. Yeh;C. T. Tsai;M. Ma; I. S. Lin; V. C. Su; J. B. Kuo; R. Lee; G. S. Lin; D. Chen; C. S. Yeh; C. T. Tsai; M. Ma; JAMES-B KUO
臺大學術典藏	2018-09-10T07:08:18Z	Analysis of STI-induced mechanical stress-related Kink effect of 40 nm PD SOI NMOS devices biased in saturation region	I. S. Lin;J. B. Kuo; I. S. Lin; J. B. Kuo; JAMES-B KUO
臺大學術典藏	2018-09-10T07:08:18Z	Analysis of STI-induced mechanical stress-related Kink effect of 40 nm PD SOI NMOS devices biased in saturation region	I. S. Lin;J. B. Kuo; I. S. Lin; J. B. Kuo; JAMES-B KUO
臺大學術典藏	2018-09-10T07:08:18Z	STI-Induced Mechanical-Stress-Related Kink Effect of 40nm PD SOI NMOS Devices	I. S. Lin; V. C. Su; J. B. Kuo; D. Chen; C. S. Yeh; C. T. Tsai; M. Ma; JAMES-B KUO
臺大學術典藏	2018-09-10T07:08:18Z	Analysis of STI Mechanical-Stress Induced Effects of Nanometer PD SOI NMOS Devices	J. B. Kuo; J. B. Kuo; JAMES-B KUO
臺大學術典藏	2018-09-10T07:08:18Z	Analysis of STI Mechanical-Stress Induced Effects of Nanometer PD SOI NMOS Devices	J. B. Kuo; J. B. Kuo; JAMES-B KUO
臺大學術典藏	2018-09-10T07:08:18Z	STI-Induced Mechanical Stress-Related Breakdown Behavior of 40nm PD SOI NMOS Devices	J. B. Kuo; D. Chen; C. S. Yeh; C. T. Tsai; M. Ma; JAMES-B KUO
臺大學術典藏	2018-09-10T06:35:01Z	Modeling the Drain Current of DG FD SOI NMOS Devices with N+/P+ Top/Bottom Gate	C. H. Hsu; J. B. Kuo; JAMES-B KUO
臺大學術典藏	2018-09-10T06:35:00Z	Triple Threshold Static Power Minimization in High-Level Synthesis of VLSI CMOS	H. Chen; J. B. Kuo; M. Syrzycki; JAMES-B KUO
臺大學術典藏	2018-09-10T06:35:00Z	Low-Voltage Single-Phase Clocking Adiabatic DCVS Logic Circuit with Pass Gate Logic	E. K. Loo; J. B. Kuo; M. Syrzycki; JAMES-B KUO
臺大學術典藏	2018-09-10T06:35:00Z	Modeling the Gate Tunneling Current Effects of Sub-100nm NMOS Devices with an Ultra-thin (1nm) Gate Oxide	J. B. Kuo; JAMES-B KUO

Showing items 101-125 of 176 (8 Page(s) Totally)
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