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| 臺大學術典藏 |
2020-04-01T07:57:48Z |
Branching ratios of C2 products in the photodissociation of C2H at 193 nm
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Lin, S. H.; Mebel, A. M.; Hayashi, M.; Jackson, W. M.; Wrobel, J.; Green, M.; Xu, D. |
| 臺大學術典藏 |
2018-09-10T07:40:59Z |
Photodissociation of propyne and allene at 193 nm with vacuum ultraviolet detection of the products
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Ni, C. K.; Huang, J. D.; Chen, Y. T.; Kung, A. H.; Jackson, W. M.; YIT-TSONG CHEN |
| 國立臺灣大學 |
1999 |
Photodissociation of propyne and allene at 193 nm with vacuum ultraviolet detection of the products
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Ni, Chi-Kung; Huang, J. D.; Chen, Yit Tsong; Kung, A. H.; Jackson, W. M. |
| 國立臺灣大學 |
1991 |
Molecular Beam Studies of the Photolysis of Allene and the Secondary Dissociation of the C3Hx Fragments
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Jackson, W. M.; Anex, Deon S.; Continetti, R. E.; Balko, B. A.; 李遠哲; Jackson, W. M.; Anex, Deon S.; Continetti, R. E.; Balko, B. A.; Lee, Yuan-Tseh |
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