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机构 日期 题名 作者
國立交通大學 2014-12-08T15:44:34Z Effect of rapid thermal annealed TiN barrier layer on BST capacitors prepared by RF magnetron cosputter system at low substrate temperatures Hwang, CC; Jaing, CC; Lai, MJ; Chen, JS; Huang, S; Juang, MH; Cheng, HC
國立交通大學 2014-12-08T15:44:31Z Low-temperature process to improve the leakage current of (Ba, Sr)TiO3 films on Pt/TiN/Ti/Si substrates Hwang, CC; Lai, MJ; Jaing, CC; Chen, JS; Huang, S; Juang, MH; Cheng, HC
國立交通大學 2014-12-08T15:44:19Z Effect of rapid-thermal-annealed TiN barrier layer on the Pt/BST/Pt capacitors prepared by RF magnetron co-sputter technique at low substrate temperature Hwang, CC; Juang, MH; Lai, MJ; Jaing, CC; Chen, JS; Huang, S; Cheng, HC
國立交通大學 2014-12-08T15:41:20Z Effects of post-oxygen plasma treatment on Pt/(Ba,Sr)TiO3/Pt capacitors at low substrate temperatures Shye, DC; Hwang, CC; Lai, MJ; Jaing, CC; Chen, JS; Huang, S; Juang, MH; Chiou, BS; Cheng, HC
國立交通大學 2014-12-08T15:41:08Z The effects of post excimer laser annealing on (Ba,Sr)TiO3 thin films at low substrate temperatures Shye, DC; Chiou, BS; Hwang, CC; Jaing, CC; Hsu, HW; Chen, JS; Cheng, HC
國立交通大學 2014-12-08T15:26:56Z Effect of TiN treated by rapid thermal annealing on properties of BST capacitors prepared by RF magnetron co-sputter system at low substrate temperature Teng, TH; Hwang, CC; Lai, MJ; Huang, SC; Chen, JS; Jaing, CC; Cheng, HC

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