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Showing items 1-6 of 6 (1 Page(s) Totally)
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| 臺大學術典藏 |
2018-09-10T06:57:01Z |
Application of anodization followed by rapid thermal treatment to thin gate oxide growth
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Jeng, Ming-Jer; Hwu, Jenn-Gwo; JENN-GWO HWU |
| 臺大學術典藏 |
2018-09-10T06:57:01Z |
C-V hysteresis instability in aluminum/tantalum oxide/silicon oxide/silicon capacitors due to postmetallization annealing and Co-60 irradiation
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Hwu, Jenn-Gwo;Jeng, Ming-Jer; Hwu, Jenn-Gwo; Jeng, Ming-Jer; JENN-GWO HWU |
| 臺大學術典藏 |
2018-09-10T06:57:00Z |
Effect of oxidation pressure on the characteristics of fluorinated thin gate oxides prepared by room temperature deposition followed by rapid thermal oxidation
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Yeh, Kuo-Lang; Jeng, Ming-Jer; Hwu, Jenn-Gwo; JENN-GWO HWU |
| 淡江大學 |
2010-06 |
Noise Mitigation Capability Comparison: Power Bus Isolation vs. Power Plane Segmentation
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Chou, Yun-Hsih; Jeng, Ming-Jer; Tsai, Ming-Chang; Lee, Yang-Han; Jan, Yih-Guang |
| 國立臺灣大學 |
1999 |
Fluorinated thin gate oxides prepared by room temperature deposition followed by furnace oxidation
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Yeh, Kuo-Lang; Jeng, Ming-Jer; Hwu, Jenn-Gwo |
| 國立臺灣大學 |
1996 |
Rapid thermal post-metallization annealing effect on thin gate oxides
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Jeng, Ming-Jer; Lin, Huang-Shen; Hwu, Jenn-Gwo |
Showing items 1-6 of 6 (1 Page(s) Totally)
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