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"jia han li"的相關文件
顯示項目 161-170 / 280 (共28頁)
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| 臺大學術典藏 |
2020-01-17T07:45:17Z |
Fresnel zone plate manufacturability analysis for direct-write lithography by simulating focusing and patterning performance versus fabrication errors
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Tsai, K.-Y.; Chen, S.-Y.; Pei, T.-H.; Li, J.-H.; JIA-HAN LI |
| 臺大學術典藏 |
2020-01-17T07:45:17Z |
Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method
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Lee, Y.-M.; Li, J.-H.; Ng, P.C.W.; Pei, T.-H.; Wang, F.-M.; Tsai, K.-Y.; Chen, A.C.; JIA-HAN LI |
| 臺大學術典藏 |
2020-01-17T07:45:17Z |
Terahertz field enhancement in doped semiconductor slot cavities
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JIA-HAN LI; Webb, K.J.; Li, J. |
| 臺大學術典藏 |
2020-01-17T07:45:17Z |
Using transmission line theory to calculate equivalent refractive index of EUV mask multilayer structures for efficient scattering simulation by finite-difference time-domain method
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Lee, Y.-M.; Li, J.-H.; Ng, P.C.W.; Pei, T.-H.; Wang, F.-M.; Tsai, K.-Y.; Chen, A.C.; JIA-HAN LI |
| 臺大學術典藏 |
2020-01-17T07:45:17Z |
Stochastic simulation of photon scattering for EUV mask defect inspection
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Pei, T.-H.; Tsai, K.-Y.; Li, J.-H.; JIA-HAN LI |
| 臺大學術典藏 |
2020-01-17T07:45:16Z |
Effects of the tip shape on the localized field enhancement and far field radiation pattern of the plasmonic inverted pyramidal nanostructures with the tips for surfaceenhanced Raman scattering
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JIA-HAN LI; Li, J.-H.; Cheng, H.-H.; Chen, S.-W.; Chang, Y.-Y.; Chu, J.-Y.; Lin, D.-Z.; Chen, Y.-P. |
| 臺大學術典藏 |
2020-01-17T07:45:16Z |
Resonance modes, cavity field enhancements, long-range collective photonic effects in periodic bowtie nanostructures
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Hsueh, C.-H.; Lin, C.-H.; Li, J.-H.; Hatab, N.A.; Gu, B.; JIA-HAN LI |
| 臺大學術典藏 |
2020-01-17T07:45:16Z |
Erratum: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects (Journal of Micro/ Nanolithography, MEMS, and MOEMS (2011) 10 (013004))
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Ng, P.C.W.; Tsai, K.-Y.; Lee, Y.-M.; Wang, F.-M.; Li, J.-H.; Chen, A.C.; JIA-HAN LI |
| 臺大學術典藏 |
2020-01-17T07:45:16Z |
Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects
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Ng, P.C.W.; Tsai, K.-Y.; Lee, Y.-M.; Wang, F.-M.; Li, J.-H.; Chen, A.C.; JIA-HAN LI |
| 臺大學術典藏 |
2020-01-17T07:45:16Z |
On the development of a triple-preserving Maxwell's equations solver in non-staggered grids
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JIA-HAN LI; Li, J.H.; Chiu, P.H.; Sheu, T.W.H.; Hung, Y.W.; Tsai, M.H. |
顯示項目 161-170 / 280 (共28頁)
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