臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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機構	日期	題名	作者
臺大學術典藏	2018-09-10T08:46:35Z	Multilayer Mirror Structure	Jia-Han Li;Yen-Min Lee;Kuen-Yu Tsai; Jia-Han Li; Yen-Min Lee; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:35Z	Multilayer Mirror Structure	Jia-Han Li;Yen-Min Lee;Kuen-Yu Tsai; Jia-Han Li; Yen-Min Lee; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method for Calibrating A Manufacturing Process Model (National Taiwan University/ASML Holding N.V.)	Kuen-Yu Tsai;Alek C. Chen;Jia-Han Li; Kuen-Yu Tsai; Alek C. Chen; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:34Z	Method for Calibrating A Manufacturing Process Model (National Taiwan University/ASML Holding N.V.)	Kuen-Yu Tsai;Alek C. Chen;Jia-Han Li; Kuen-Yu Tsai; Alek C. Chen; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:33Z	Optical metrology of shape-varying nano-patterned gratings by analyzing the scattering signals in their pupil images	Yen-Min Lee; Jia-Han Li; Fu-Min Wang; Hsin-Hung Cheng; Yu-Tian Shen; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:46:32Z	Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects	Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:26Z	Fabrication of metrology test structures with programmed line edge roughness using electron beam direct write	Fu-Min Wang;Kuen-Yu Tsai;Jia-Han Li;Alek C. Chen;Yen-Min Lee;Yu-Tian Shen;Hsin-Hung Cheng;Chieh-Hsiang Kuan; Fu-Min Wang; Kuen-Yu Tsai; Jia-Han Li; Alek C. Chen; Yen-Min Lee; Yu-Tian Shen; Hsin-Hung Cheng; Chieh-Hsiang Kuan; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:26Z	Fabrication of metrology test structures with programmed line edge roughness using electron beam direct write	Fu-Min Wang;Kuen-Yu Tsai;Jia-Han Li;Alek C. Chen;Yen-Min Lee;Yu-Tian Shen;Hsin-Hung Cheng;Chieh-Hsiang Kuan; Fu-Min Wang; Kuen-Yu Tsai; Jia-Han Li; Alek C. Chen; Yen-Min Lee; Yu-Tian Shen; Hsin-Hung Cheng; Chieh-Hsiang Kuan; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:26Z	Iterative finite-difference method for analyzing fabrication errors of lens-misaligned electron-beam direct-write lithography system	Yen-Min Lee;Jia-Han Li;Sheng-Yung Chen;Shiau-Yi Ma;Kuen-Yu Tsai;Tony W. H. Sheu;Jia-Yush Yen; Yen-Min Lee; Jia-Han Li; Sheng-Yung Chen; Shiau-Yi Ma; Kuen-Yu Tsai; Tony W. H. Sheu; Jia-Yush Yen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:26Z	Iterative finite-difference method for analyzing fabrication errors of lens-misaligned electron-beam direct-write lithography system	Yen-Min Lee;Jia-Han Li;Sheng-Yung Chen;Shiau-Yi Ma;Kuen-Yu Tsai;Tony W. H. Sheu;Jia-Yush Yen; Yen-Min Lee; Jia-Han Li; Sheng-Yung Chen; Shiau-Yi Ma; Kuen-Yu Tsai; Tony W. H. Sheu; Jia-Yush Yen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:25Z	High spatial resolution and large field intensity by a set of two modified zone plates	Zhan-Yu Liu;Yao-Jen Tsai;Jia-Han Li;Kuen-Yu Tsai; Zhan-Yu Liu; Yao-Jen Tsai; Jia-Han Li; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:25Z	High spatial resolution and large field intensity by a set of two modified zone plates	Zhan-Yu Liu;Yao-Jen Tsai;Jia-Han Li;Kuen-Yu Tsai; Zhan-Yu Liu; Yao-Jen Tsai; Jia-Han Li; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:21Z	Stochastic simulation of photon scattering for EUV mask defect inspection	Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:21Z	Stochastic simulation of photon scattering for EUV mask defect inspection	Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:20Z	Fresnel zone plate manufacturability analysis for direct-write lithography by simulating focusing and patterning performance versus fabrication errors	Kuen-Yu Tsai; Sheng-Yung Chen; Ting-Han Pei; Jia-Han Li; KUEN-YU TSAI; Kuen-Yu Tsai;Sheng-Yung Chen;Ting-Han Pei;Jia-Han Li
臺大學術典藏	2018-09-10T08:18:20Z	Fresnel zone plate manufacturability analysis for direct-write lithography by simulating focusing and patterning performance versus fabrication errors	Kuen-Yu Tsai; Sheng-Yung Chen; Ting-Han Pei; Jia-Han Li; KUEN-YU TSAI; Kuen-Yu Tsai;Sheng-Yung Chen;Ting-Han Pei;Jia-Han Li
臺大學術典藏	2018-09-10T08:18:20Z	Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method	Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Hang Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Hang Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:20Z	Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method	Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Hang Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Hang Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T07:42:07Z	Using transmission line theory to calculate equivalent refractive index of EUV mask multilayer structures for efficient scattering simulation by finite-difference time-domain method	Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Han Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Han Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T07:42:07Z	Using transmission line theory to calculate equivalent refractive index of EUV mask multilayer structures for efficient scattering simulation by finite-difference time-domain method	Yen-Min Lee;Jia-Han Li;Philip C. W. Ng;Ting-Han Pei;Fu-Min Wang;Kuen-Yu Tsai;Alek C. Chen; Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Han Pei; Fu-Min Wang; Kuen-Yu Tsai; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T07:42:06Z	Effects of Fresnel zone plate fabrication errors on focusing performances	Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2018-09-10T07:42:06Z	Effects of Fresnel zone plate fabrication errors on focusing performances	Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2018-09-10T07:42:06Z	A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows	Philip C. W. Ng;Kuen-Yu Tsai;Yen-Min Lee;Ting-Han Pei;Fu-Min Wang;Jia-Han Li;Alek C. Chen; Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Ting-Han Pei; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T07:42:06Z	A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows	Philip C. W. Ng;Kuen-Yu Tsai;Yen-Min Lee;Ting-Han Pei;Fu-Min Wang;Jia-Han Li;Alek C. Chen; Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Ting-Han Pei; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏	2018	Effects of band shifting on permittivity of plasmonic material	Chiu, M.-H.; Li, J.-H.; JIA-HAN LI

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