臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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機構	日期	題名	作者
臺大學術典藏	2018-09-10T08:46:32Z	Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects	Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Fu-Min Wang; Jia-Han Li; Alek C. Chen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:26Z	Fabrication of metrology test structures with programmed line edge roughness using electron beam direct write	Fu-Min Wang;Kuen-Yu Tsai;Jia-Han Li;Alek C. Chen;Yen-Min Lee;Yu-Tian Shen;Hsin-Hung Cheng;Chieh-Hsiang Kuan; Fu-Min Wang; Kuen-Yu Tsai; Jia-Han Li; Alek C. Chen; Yen-Min Lee; Yu-Tian Shen; Hsin-Hung Cheng; Chieh-Hsiang Kuan; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:26Z	Fabrication of metrology test structures with programmed line edge roughness using electron beam direct write	Fu-Min Wang;Kuen-Yu Tsai;Jia-Han Li;Alek C. Chen;Yen-Min Lee;Yu-Tian Shen;Hsin-Hung Cheng;Chieh-Hsiang Kuan; Fu-Min Wang; Kuen-Yu Tsai; Jia-Han Li; Alek C. Chen; Yen-Min Lee; Yu-Tian Shen; Hsin-Hung Cheng; Chieh-Hsiang Kuan; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:26Z	Iterative finite-difference method for analyzing fabrication errors of lens-misaligned electron-beam direct-write lithography system	Yen-Min Lee;Jia-Han Li;Sheng-Yung Chen;Shiau-Yi Ma;Kuen-Yu Tsai;Tony W. H. Sheu;Jia-Yush Yen; Yen-Min Lee; Jia-Han Li; Sheng-Yung Chen; Shiau-Yi Ma; Kuen-Yu Tsai; Tony W. H. Sheu; Jia-Yush Yen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:26Z	Iterative finite-difference method for analyzing fabrication errors of lens-misaligned electron-beam direct-write lithography system	Yen-Min Lee;Jia-Han Li;Sheng-Yung Chen;Shiau-Yi Ma;Kuen-Yu Tsai;Tony W. H. Sheu;Jia-Yush Yen; Yen-Min Lee; Jia-Han Li; Sheng-Yung Chen; Shiau-Yi Ma; Kuen-Yu Tsai; Tony W. H. Sheu; Jia-Yush Yen; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:25Z	High spatial resolution and large field intensity by a set of two modified zone plates	Zhan-Yu Liu;Yao-Jen Tsai;Jia-Han Li;Kuen-Yu Tsai; Zhan-Yu Liu; Yao-Jen Tsai; Jia-Han Li; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:25Z	High spatial resolution and large field intensity by a set of two modified zone plates	Zhan-Yu Liu;Yao-Jen Tsai;Jia-Han Li;Kuen-Yu Tsai; Zhan-Yu Liu; Yao-Jen Tsai; Jia-Han Li; Kuen-Yu Tsai; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:21Z	Stochastic simulation of photon scattering for EUV mask defect inspection	Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:21Z	Stochastic simulation of photon scattering for EUV mask defect inspection	Ting-Hang Pei;Kuen-Yu Tsai;Jia-Han Li; Ting-Hang Pei; Kuen-Yu Tsai; Jia-Han Li; KUEN-YU TSAI
臺大學術典藏	2018-09-10T08:18:20Z	Fresnel zone plate manufacturability analysis for direct-write lithography by simulating focusing and patterning performance versus fabrication errors	Kuen-Yu Tsai; Sheng-Yung Chen; Ting-Han Pei; Jia-Han Li; KUEN-YU TSAI; Kuen-Yu Tsai;Sheng-Yung Chen;Ting-Han Pei;Jia-Han Li

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