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机构 日期 题名 作者
國立交通大學 2014-12-08T15:48:55Z A novel process to form cobalt silicided p(+) poly-Si gates by BF2+ implantation into bilayered CoSi/a-Si films and subsequent anneal Lai, WK; Liu, HW; Juang, MH; Chen, NC; Cheng, HC
國立交通大學 2014-12-08T15:47:36Z Effects of CoSi2 on p(+) polysilicon gates fabricated by BF2+ implantation into CoSi amorphous Si bilayers Cheng, HC; Lai, WK; Liu, HW; Juang, MH
國立交通大學 2014-12-08T15:46:51Z Formation of silicided shallow p(+) n junctions by BF2+ implantation into thin amorphous-Si or Ni/amorphous-Si films on Si substrates and subsequent Ni silicidation Juang, MH; Hu, MC; Yang, CJ
國立交通大學 2014-12-08T15:46:27Z Effects of rapid thermal annealing on cobalt silicided p(+) poly-Si gates fabricated by BF2+ implantation into bilayered CoSi/a-Si films Lai, WK; Liu, HW; Juang, MH; Cheng, HC
國立交通大學 2014-12-08T15:46:12Z Suppression of boron penetration for p(+) stacked poly-Si gates by using inductively coupled N-2 plasma treatment Cheng, HC; Lai, WK; Hwang, CC; Juang, MH; Chu, SC; Liu, TF
國立交通大學 2014-12-08T15:44:34Z Effect of rapid thermal annealed TiN barrier layer on BST capacitors prepared by RF magnetron cosputter system at low substrate temperatures Hwang, CC; Jaing, CC; Lai, MJ; Chen, JS; Huang, S; Juang, MH; Cheng, HC
國立交通大學 2014-12-08T15:44:31Z Low-temperature process to improve the leakage current of (Ba, Sr)TiO3 films on Pt/TiN/Ti/Si substrates Hwang, CC; Lai, MJ; Jaing, CC; Chen, JS; Huang, S; Juang, MH; Cheng, HC
國立交通大學 2014-12-08T15:44:19Z Effect of rapid-thermal-annealed TiN barrier layer on the Pt/BST/Pt capacitors prepared by RF magnetron co-sputter technique at low substrate temperature Hwang, CC; Juang, MH; Lai, MJ; Jaing, CC; Chen, JS; Huang, S; Cheng, HC
國立交通大學 2014-12-08T15:41:20Z Effects of post-oxygen plasma treatment on Pt/(Ba,Sr)TiO3/Pt capacitors at low substrate temperatures Shye, DC; Hwang, CC; Lai, MJ; Jaing, CC; Chen, JS; Huang, S; Juang, MH; Chiou, BS; Cheng, HC
國立交通大學 2014-12-08T15:38:50Z Fabrication of trench-gate power MOSFETs by using a dual doped body region Juang, MH; Chen, WT; Ou-Yang, CI; Jang, SL; Lin, MJ; Cheng, HC
國立交通大學 2014-12-08T15:05:05Z GROWTH OF SINGLE-CRYSTALLINE COSI2 ON (111)SI AT LOW ANNEALING TEMPERATURES BY A NONULTRAHIGH VACUUM METHOD CHENG, HC; JUANG, MH
國立交通大學 2014-12-08T15:05:00Z EFFECTS OF RAPID THERMAL ANNEALING ON THE FORMATION OF SHALLOW P+N JUNCTION BY IMPLANTING BF2+ IONS INTO THIN METAL-FILMS ON SI SUBSTRATE .1. THIN TITANIUM FILMS JUANG, MH; CHENG, HC
國立交通大學 2014-12-08T15:05:00Z EFFECTS OF RAPID THERMAL ANNEALING ON THE FORMATION OF SHALLOW P+N JUNCTION BY IMPLANTING BF2+ IONS INTO THIN METAL-FILMS ON SI SUBSTRATE .2. THIN COBALT FILMS JUANG, MH; CHENG, HC
國立交通大學 2014-12-08T15:04:57Z THE REVERSE ANNEAL OF JUNCTION CHARACTERISTICS IN FORMING SHALLOW P+-N JUNCTION BY BF-2(+) IMPLANTATION INTO THIN CO FILMS ON SI SUBSTRATE JUANG, MH; CHENG, HC
國立交通大學 2014-12-08T15:04:57Z NOVEL ANNEALING SCHEME FOR FABRICATING HIGH-QUALITY TI-SILICIDED SHALLOW N+P JUNCTION BY P+ IMPLANTATION INTO THIN TI FILMS ON SI SUBSTRATE JUANG, MH; CHENG, HC
國立交通大學 2014-12-08T15:04:57Z INFLUENCE OF IMPLANT CONDITION ON THE TRANSIENT-ENHANCED DIFFUSION OF ION-IMPLANTED BORON IN SILICON JUANG, MH; WAN, FS; LIU, HW; CHENG, KL; CHENG, HC
國立交通大學 2014-12-08T15:04:56Z SUPPRESSION OF ANOMALOUS DIFFUSION OF ION-IMPLANTED BORON IN SILICON BY LASER PROCESSING JUANG, MH; WAN, FS; LIU, HW; CHENG, KL; CHENG, HC
國立交通大學 2014-12-08T15:04:56Z FORMATION OF SHALLOW P+N JUNCTIONS BY IMPLANTING BF2+ IONS INTO THIN COBALT FILMS ON SILICON SUBSTRATES JUANG, MH; CHENG, HC
國立交通大學 2014-12-08T15:04:55Z FORMATION OF P(+)N JUNCTIONS BY SI(+)+B(+) IMPLANTATION AND LASER ANNEALING JUANG, MH; CHENG, HC
國立交通大學 2014-12-08T15:04:51Z NOVEL EFFECTS OF HEATING RATE ON THE ACTIVATION RECRYSTALLIZATION OF BORON-IMPLANTED SI SUBSTRATES JUANG, MH; CHENG, HC
國立交通大學 2014-12-08T15:04:50Z FILM THICKNESS EFFECT ON THE EPITAXIAL-GROWTH OF COSI2 ON SI(111) JUANG, MH; CHENG, HC
國立交通大學 2014-12-08T15:04:47Z CONVENTIONAL FURNACE AND RAPID THERMAL ANNEALING OF COBALT FILMS ON SI(111) JUANG, MH; CHENG, HC
國立交通大學 2014-12-08T15:04:46Z FORMATION OF SELF-ALIGNED TISI2 P+-N JUNCTIONS BY IMPLANTING BF2+ IONS THROUGH THIN TI OR SIO2 FILM ON SI SUBSTRATE RAPID THERMAL ANNEALING JUANG, MH; CHENG, HC
國立交通大學 2014-12-08T15:04:46Z CHARACTERIZATION OF SILICIDED SHALLOW N+P JUNCTIONS FORMED BY P+ IMPLANTATION INTO THIN TI FILMS ON SI SUBSTRATES JUANG, MH; CHENG, HC
國立交通大學 2014-12-08T15:04:43Z ACTIVATION MECHANISM OF IMPLANTED BORON IN A SI SUBSTRATE JUANG, MH; CHENG, HC

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