|
English
|
正體中文
|
简体中文
|
0
|
|
???header.visitor??? :
50898391
???header.onlineuser??? :
700
???header.sponsordeclaration???
|
|
|
|
???tair.name??? >
???browser.page.title.author???
|
"juang mh"???jsp.browse.items-by-author.description???
Showing items 31-34 of 34 (4 Page(s) Totally)
<< < 1 2 3 4
View [10|25|50] records per page
| 國立交通大學 |
2014-12-08T15:03:48Z |
A SILICIDATION-INDUCED PROCESS CONSIDERATION FOR FORMING SCALE-DOWN SILICIDED JUNCTION
|
CHENG, HC; JUANG, MH; LIN, CT; HUANG, LM |
| 國立交通大學 |
2014-12-08T15:03:46Z |
FORMATION OF SHALLOW P(+)N JUNCTIONS BY BF2+ IMPLANTATION INTO THIN POLYCRYSTALLINE SI FILMS
|
LIN, CT; JUANG, MH; JAN, ST; CHOU, PF; CHENG, HC |
| 國立交通大學 |
2014-12-08T15:03:35Z |
SILICIDE-CAUSED ANOMALOUS REVERSE CURRENT-VOLTAGE CHARACTERISTICS OF COSI2 SHALLOW P(+)N JUNCTIONS
|
JUANG, MH; LIN, CT; CHENG, HC |
| 國立交通大學 |
2014-12-08T15:03:30Z |
EFFECTS OF COBALT SILICIDATION ON THE ELECTRICAL CHARACTERISTICS OF SHALLOW P(+)N JUNCTIONS FORMED BY BF2+ IMPLANTATION INTO THIN POLYCRYSTALLINE SI FILMS
|
LIN, CT; CHAO, CH; JUANG, MH; JAN, ST; CHOU, PF; CHENG, HC |
Showing items 31-34 of 34 (4 Page(s) Totally)
<< < 1 2 3 4
View [10|25|50] records per page
|
