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國立交通大學 2014-12-12T02:23:13Z 利用 N2O 與 N2 氣體快速加熱氮化於 PECVD TEOS閘極氧化層及複晶矽氧化層之研究 朱浚學; Juing-Shae Chu; 雷添福; 李崇仁; Dr. Tan-Fu Lei; Dr. Chung-Len Lee

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