臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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Institution	Date	Title	Author
國立中山大學	2007	Electrical Characteristics of Liquid-Phase-Deposited Titanium Oxide Films on (NH4)2Sx-Treated InP Substrate	Ming-Kwei Lee; Jung-Jie Huang; Chih-Feng Yen
國立中山大學	2006	Electrical characteristics of postmetallization-annealed MOCVD-TiO2 films on ammonium sulfide-treated GaAs	Ming-Kwei Lee; Chih-Feng Yen; Jung-Jie Huang; Shi-Hao Lin
國立中山大學	2006	Electrical Characteristics of Liquid Phase Deposited TiO2 Films on GaAs Substrate with (NH4)2Sx treatment	Ming-Kwei Lee; Chih-Feng Yen; Jung-Jie Huang
國立中山大學	2005-11	Electrical Characteristics of LPD TiO2 Films on GaAs Substrate with (NH4)2Sx treatment	Ming-Kwei Lee;Chih-Feng Yen;Jung-Jie Huang
國立中山大學	2005-11	Variation of electrical characteristics of LPD-SiO2/oxygen-annealed MOCVD- TiO2 films on Si substrate by nitrogen annealing	Ming-Kwei Lee;Chih-Feng Yen;Jung-Jie Huang;Shi-Hao Lin
國立中山大學	2005	Variation of electrical characteristics of metallorganic chemical vapor deposited TiO2 films by postmetallization annealing	Ming-Kwei Lee; Jung-Jie Huang; Yu-Hsiang Hung
國立中山大學	2005	Electrical characteristics improvement of oxygen annealed MOCVD-TiO2 films	Ming-Kwei Lee; Jung-Jie Huang; Tsung-Shun Wu
國立中山大學	2005	Low Leakage Current Flrorinated LPD-SiO2/MOCVD-TiO2 Films	Ming-Kwei Lee; Jung-Jie Huang; Tsung-Shun Wu
國立中山大學	2004-12	High dielectric constant and low leakage current LPD-SiO2/MOCVD-TiO2 films	Ming-Kwei Lee;Jung-Jie Huang;Tsung-Shun Wu
國立中山大學	2003-11	O2 and N2O as the oxidizer of TiO2 thin films on Si prepared by metal organic chemical vapor deposition	Ming-Kwei Lee;Jung-Jie Huang;Wei-Cheng Chen;Tsung-Shun Wu
國立中山大學	2003	Properties of TiO2 thin film on GaAs prepared by Metalorganic Chemical Vapor Deposition	Ming-Kwei Lee; Jung-Jie Huang; Yi-Min Hung; Ming-Chi Fan

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