| 國立中山大學 |
2007 |
Electrical Characteristics of Liquid-Phase-Deposited Titanium Oxide Films on (NH4)2Sx-Treated InP Substrate
|
Ming-Kwei Lee; Jung-Jie Huang; Chih-Feng Yen |
| 國立中山大學 |
2006 |
Electrical characteristics of postmetallization-annealed MOCVD-TiO2 films on ammonium sulfide-treated GaAs
|
Ming-Kwei Lee; Chih-Feng Yen; Jung-Jie Huang; Shi-Hao Lin |
| 國立中山大學 |
2006 |
Electrical Characteristics of Liquid Phase Deposited TiO2 Films on GaAs Substrate with (NH4)2Sx treatment
|
Ming-Kwei Lee; Chih-Feng Yen; Jung-Jie Huang |
| 國立中山大學 |
2005-11 |
Electrical Characteristics of LPD TiO2 Films on GaAs Substrate with (NH4)2Sx treatment
|
Ming-Kwei Lee;Chih-Feng Yen;Jung-Jie Huang |
| 國立中山大學 |
2005-11 |
Variation of electrical characteristics of LPD-SiO2/oxygen-annealed MOCVD- TiO2 films on Si substrate by nitrogen annealing
|
Ming-Kwei Lee;Chih-Feng Yen;Jung-Jie Huang;Shi-Hao Lin |
| 國立中山大學 |
2005 |
Variation of electrical characteristics of metallorganic chemical vapor deposited TiO2 films by postmetallization annealing
|
Ming-Kwei Lee; Jung-Jie Huang; Yu-Hsiang Hung |
| 國立中山大學 |
2005 |
Electrical characteristics improvement of oxygen annealed MOCVD-TiO2 films
|
Ming-Kwei Lee; Jung-Jie Huang; Tsung-Shun Wu |
| 國立中山大學 |
2005 |
Low Leakage Current Flrorinated LPD-SiO2/MOCVD-TiO2 Films
|
Ming-Kwei Lee; Jung-Jie Huang; Tsung-Shun Wu |
| 國立中山大學 |
2004-12 |
High dielectric constant and low leakage current LPD-SiO2/MOCVD-TiO2 films
|
Ming-Kwei Lee;Jung-Jie Huang;Tsung-Shun Wu |
| 國立中山大學 |
2003-11 |
O2 and N2O as the oxidizer of TiO2 thin films on Si prepared by metal organic chemical vapor deposition
|
Ming-Kwei Lee;Jung-Jie Huang;Wei-Cheng Chen;Tsung-Shun Wu |
| 國立中山大學 |
2003 |
Properties of TiO2 thin film on GaAs prepared by Metalorganic Chemical Vapor Deposition
|
Ming-Kwei Lee; Jung-Jie Huang; Yi-Min Hung; Ming-Chi Fan |
